均匀分离连续注入电子脉冲的空间电荷限制密度

Y. Liu, Peng Zhang, Shih-Hung Chen, L. Ang
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引用次数: 0

摘要

提出了一种一维模型,用于研究多电子脉冲序列在二极管内的空间电荷限制密度注入。结果表明,当注入N个等时间间隔脉冲时,每个脉冲的电荷密度有一个最大值。通过与数值解的比较,我们得到了一个解析式,只要给出间隙间距、间隙电压和脉冲间的初始时间间隔值,就可以快速给出电荷密度注入的上限。在考虑相对论效应的情况下,用数MeV以下束流能量运动方程的数值解对模型进行了验证。本文的工作对超高速电子显微镜或自由电子激光器中多脉冲电子枪的设计有一定的指导意义。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Space-charge limited density of consecutively injected electron pulses with uniform separation
A one-dimensional model to study the space-charge limited density injection of a train of multiple electron pulse into a diode is presented. It is found that there is a maximal value of charge density per pulse for N number of pulse of equal time separation that can be injected. By comparing with numerical solutions, we obtain an analytical formula, which can quickly provide such upper limit of charge density injection once the values of gap spacing, gap voltage and the initial time separation between the pulses are provided. The model has been verified with the numerical solutions of the equation of motion up to a few MeV of beam energy for which the relativistic effect is included. This work should be useful in the design of multiple pulses of electron guns in the application of ultra-fast electron microscopy or free electron lasers.
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