TCAD中辐射损伤的建模

D. Passeri, F. Moscatelli, A. Morozzi
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引用次数: 1

摘要

这项工作的目的是在设备层面开发TCAD辐射损伤模型,从而对探测器的电气行为进行预测性洞察,并针对HL-LHC预期影响(例如大于2.0 $ $\乘以$ 10$ $ {16}$ 1 MeV等效中子/cm$ $^2$)的操作进行最终性能优化。我们的方法旨在尽可能减少拟合参数的数量,同时考虑到这些非常高的影响下相关效应的新实验证据(例如电荷倍增和雪崩效应)。目前正在寻求一种物理接地方法,旨在设计一种不过于具体的建模,同时保持对不同供应商(例如采用不同技术风格)和不同操作条件(例如在不同影响、温度和偏置电压下)制造的设备行为的预测能力。该模型的开发遵循了一个具有双重目标的测试活动:一方面,测量了相关的技术参数,如氧化物电荷和界面陷阱状态作为辐照剂量的函数。另一方面,门控二极管和MOS电容的直流和交流测量可作为TCAD仿真模型验证的参考。完整的体积和表面辐射损伤模型可用于分析不同类型的新一代探测器的活性行为,这些探测器将用于未来的HEP实验。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Modeling radiation damage in TCAD
The aim of this work is to develop a TCAD radiation damage model at a device level, enabling a predictive insight on the electrical behaviour of detectors and aiming at their ultimate performance optimization for the operation at HL-LHC expected fluences (e.g. greater than 2.0 $\times$ 10$^{16}$ 1 MeV equivalent neutrons/cm$^2$). Our approach aims at keeping the number of fitting parameters as low as possible, at the same time accounting for new experimental evidences of relevant effects at these very high fluences (e.g. charge multiplication and avalanche effects). A physically grounded approach is being pursued, aiming at devising a not over-specific modelling while keeping predictive capabilities on the device behavior fabricated by different vendors (e.g. with different technology flavors) and in different operating conditions, e.g. at different fluences, temperatures and biasing voltages. The model development follows a test campaign with a twofold goal: from one hand, the relevant technology parameters such as oxide charge and interface trap states as a function of the irradiation dose have been measured. On the other hand, DC and AC measurements on gate-controlled diodes and MOS capacitors can be used as reference for TCAD simulation models validation purpose. The complete bulk and surface radiation damage model can be exploited for the analysis of the active behavior of different classes of new generation detectors to be used in the future HEP experiments.
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