三结InGaP/GaAS/Ge太阳能电池优化:利用Silvaco ATLAS建模与仿真,获得了效率为36.2%的空间电池的设计参数

M. Tsutagawa, S. Michael
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引用次数: 20

摘要

利用Silvaco ATLAS虚拟晶圆制造工具,给出了模拟效率最高为36.28%的InGaP/GaAs/Ge三结空间太阳能电池的设计参数。设计参数包括层材料、掺杂浓度和厚度。在Silvaco ATLAS中构建了一种已知日本太阳能电池的初始双结InGaP/GaAs模型,该模型具有已知的实验Voc和Jsc性能结果,精度低于2%,验证了使用计算机建模准确预测太阳能电池性能的可行性。一旦建立了模型的网格划分置信度、材料属性声明、模型声明、光文件和数值方法,为了提高电池的出电效率,只需要修改层掺杂浓度水平和厚度。双结电池的模拟首先通过使用遗传算法将掺杂浓度和厚度改变为先前工作的值开始,结果显示效率提高了0.6%。进一步改进遗传算法设计参数,总体效率提高0.83%。接下来,通过在验证的双结InGaP/GaAs模型上添加Ge层,建立了三结InGaP/GaAs/Ge电池模型。(由于缺乏已发表的实验数据,无法验证三重结模型。)应用相同的工艺表明,三结电池的输出功率增加。对遗传算法设计参数的额外改进主要基于顶部InGaP层是电流限制层的知识。因此,顶层厚度被最大化,直到中层和底层阴影效应开始降低功率输出。进行并记录了250多次模拟。在所有模拟中,InGaP和GaAs的最大掺杂浓度为5e19 cm−3,Ge的最大掺杂浓度为3e18 cm−3。该工艺得到了效率为36.28%的三结太阳能电池的设计参数。这个设计已经申请了临时专利。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Triple junction InGaP/GaAS/Ge solar cell optimization: The design parameters for a 36.2% efficient space cell using Silvaco ATLAS modeling & simulation
This paper presents the design parameters for a triple junction InGaP/GaAs/Ge space solar cell with a simulated maximum efficiency of 36.28% using Silvaco ATLAS Virtual Wafer Fabrication tool. Design parameters include the layer material, doping concentration, and thicknesses. An initial dual junction InGaP/GaAs model of a known Japanese solar cell was constructed in Silvaco ATLAS to an accuracy of less than 2% with known experimental Voc and Jsc performance results, validating the use of computer modeling to accurately predict solar cell performance. Once confidence of the model's meshing, material property statements, model statements, light file, and numerical methods were established, only the layer doping concentration levels and thicknesses were modified in order to improve the cell's power out efficiency. Simulations of the dual junction cell began by first changing only the doping concentrations and thicknesses to the values obtained from previous work using a genetic algorithm which showed a 0.6% increase in efficiency. Further improvements to the genetic algorithm design parameters showed an overall increase of 0.83% efficiency. Next, a triple junction InGaP/GaAs/Ge cell was modeled by adding a Ge layer to the validated dual junction InGaP/GaAs model. (The triple junction model could not be validated due to lack of published experimental data.) Applying the same process showed increased power output for the triple junction cell. The additional improvement to the genetic algorithm design parameters was principally based on the knowledge that the top InGaP layer is the current limiting layer. Hence, the top layer thickness was maximized until middle and bottom layer shadowing effects began to decrease power output. Over 250 simulations were performed and recorded. Maximum doping concentrations used real world limitations of 5e19 cm−3 for InGaP and GaAs and 3e18 cm−3 for Ge for all simulations. This process produced the design parameters for a 36.28% efficient triple junction solar cell. A provisional patent has been filed for this design.
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