射频反应溅射制备氧化钽薄膜的电学和光学特性

Proceedings of IEEE Conference on Electrical Insulation and Dielectric Phenomena - (CEIDP '93) Pub Date : 1993-10-17 DOI:10.1109/CEIDP.1993.378951

K. Miyairi

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摘要

作者对溅射氧化钽薄膜的电学和光学特性进行了研究，以期将其用作介电波导材料。实验中使用的氧化钽薄膜是在富氧环境(Ar/O/sub / = 84.5/15.5)下溅射钽靶(99.94%)得到的。溅射氧化钽薄膜具有较高的介电常数和较低的tan /spl δ /。然而，它们的电阻率和介电击穿比在电解质中阳极氧化的钽膜低。获得了高折射率薄膜。

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Electrical and optical properties of tantalum oxide thin films prepared by RF reactive sputtering

The author describes an investigation of the electrical and optical properties of sputtered tantalum oxide films with a view toward its possible use as a dielectric waveguide material. The tantalum oxide films used in the experiment were obtained by sputtering a tantalum target (99.94%) in an environment rich in oxygen (Ar/O/sub 2/ = 84.5/15.5). The sputtered tantalum oxide films show high dielectric constant and low tan /spl delta/. However, their electrical resistivity and dielectric breakdown are lower than those of tantalum films anodized in an electrolyte. High refractive-index films were obtained.<>

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Proceedings of IEEE Conference on Electrical Insulation and Dielectric Phenomena - (CEIDP '93)

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