Shuai Tang, Jie Tang, E. Okunishi, J. Uzuhashi, T. Ohkubo, M. Takeguchi, Lupin Qin
{"title":"用于原子分辨率稳定成像的LAB6纳米针场发射电子源","authors":"Shuai Tang, Jie Tang, E. Okunishi, J. Uzuhashi, T. Ohkubo, M. Takeguchi, Lupin Qin","doi":"10.1109/IVNC57695.2023.10189008","DOIUrl":null,"url":null,"abstract":"A LaB6 nanoneedle field-emission point electron source has been developed and installed in a spherical aberration- corrected transmission electron microscope (Cs-corrected TEM) for performance evaluations. A sub-Angstrom (0.96 Å) spatial resolution and small energy spread (0.38 eV) has been obtained. In addition, the LaB6 nanoneedle can work stably for more than 100 hours continuously with a fluctuation smaller than 1%, which showed more than ten times in improvement than the contemporary W(310) field- emitter and also showed the best stability in electron emission. This new electron source is expected to be applicable for other electron beam technologies, including cryo-EM, ultrafast-EM, electron beam lithography.","PeriodicalId":346266,"journal":{"name":"2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC)","volume":"15 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2023-07-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"A LAB6 Nanoneedle Field-Emission Electron Source for Stable Imaging with Atomic Resolution in a Transmission Electron Microscope\",\"authors\":\"Shuai Tang, Jie Tang, E. Okunishi, J. Uzuhashi, T. Ohkubo, M. Takeguchi, Lupin Qin\",\"doi\":\"10.1109/IVNC57695.2023.10189008\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A LaB6 nanoneedle field-emission point electron source has been developed and installed in a spherical aberration- corrected transmission electron microscope (Cs-corrected TEM) for performance evaluations. A sub-Angstrom (0.96 Å) spatial resolution and small energy spread (0.38 eV) has been obtained. In addition, the LaB6 nanoneedle can work stably for more than 100 hours continuously with a fluctuation smaller than 1%, which showed more than ten times in improvement than the contemporary W(310) field- emitter and also showed the best stability in electron emission. This new electron source is expected to be applicable for other electron beam technologies, including cryo-EM, ultrafast-EM, electron beam lithography.\",\"PeriodicalId\":346266,\"journal\":{\"name\":\"2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC)\",\"volume\":\"15 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2023-07-10\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IVNC57695.2023.10189008\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2023 IEEE 36th International Vacuum Nanoelectronics Conference (IVNC)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IVNC57695.2023.10189008","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
A LAB6 Nanoneedle Field-Emission Electron Source for Stable Imaging with Atomic Resolution in a Transmission Electron Microscope
A LaB6 nanoneedle field-emission point electron source has been developed and installed in a spherical aberration- corrected transmission electron microscope (Cs-corrected TEM) for performance evaluations. A sub-Angstrom (0.96 Å) spatial resolution and small energy spread (0.38 eV) has been obtained. In addition, the LaB6 nanoneedle can work stably for more than 100 hours continuously with a fluctuation smaller than 1%, which showed more than ten times in improvement than the contemporary W(310) field- emitter and also showed the best stability in electron emission. This new electron source is expected to be applicable for other electron beam technologies, including cryo-EM, ultrafast-EM, electron beam lithography.