{"title":"新型自对准双模复合材料的研究","authors":"E. Tikhonova, Y. Gornev","doi":"10.29003/m3101.mmmsec-2022/167-170","DOIUrl":null,"url":null,"abstract":"The paper presents a study of the structural parameters of new composite materials as hard masks in the process of self-aligned multipatterning. It was found that the film with titanium oxide had the best characteristic properties for the multipatterning process","PeriodicalId":151453,"journal":{"name":"Mathematical modeling in materials science of electronic component","volume":"75 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-04-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"INVESTIGATION OF NEW COMPOSITE MATERIALS IN THE PROCESS OF SELF-ALIGNED DOUBLE PATTERNING\",\"authors\":\"E. Tikhonova, Y. Gornev\",\"doi\":\"10.29003/m3101.mmmsec-2022/167-170\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The paper presents a study of the structural parameters of new composite materials as hard masks in the process of self-aligned multipatterning. It was found that the film with titanium oxide had the best characteristic properties for the multipatterning process\",\"PeriodicalId\":151453,\"journal\":{\"name\":\"Mathematical modeling in materials science of electronic component\",\"volume\":\"75 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-04-22\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Mathematical modeling in materials science of electronic component\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.29003/m3101.mmmsec-2022/167-170\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Mathematical modeling in materials science of electronic component","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.29003/m3101.mmmsec-2022/167-170","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
INVESTIGATION OF NEW COMPOSITE MATERIALS IN THE PROCESS OF SELF-ALIGNED DOUBLE PATTERNING
The paper presents a study of the structural parameters of new composite materials as hard masks in the process of self-aligned multipatterning. It was found that the film with titanium oxide had the best characteristic properties for the multipatterning process