分析不同钝化溶质质量比对氧化铟电子特性性能的影响

Hongbo Guo, Li Zhang, Haohan Hu, Ting Yu, Yan Li, Ning Li
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引用次数: 0

摘要

氧化铟(In2O3)材料作为薄膜晶体管(TFT)的沟道层具有良好的电子特性,但在稳定性和阈值电压方面有明显的改进可能性。我们使用聚四氟乙烯(PTFE)作为钝化层,通过固溶处理将其制备在In2O3TFT之上,从而保护器件并提高其性能。采用不同溶质重量比的PTFT钝化层对in2o3进行了电子表征,利用能量色散光谱分析了材料微区组成元素的种类和含量,并观察了逆变器驱动器的动态和静态响应。得到了适当的转换效果。结果表明,适当的PTFE钝化层溶质质量比有助于改善In2O3TFT的各种电子特性和最佳状态下各元素的相对含量。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of Different Passivation Solute Weight Ratio on Performance Influence of Indium Oxide Electronic Characteristics
Indium oxide (In2O3) material has decent electronic characteristics as the channel layer of the thin film transistor (TFT), but obviously it has the improvement possibility in terms of stability and threshold voltage. We use poly tetra fluoroethylene (PTFE) as a passivation layer to prepare it above the In2O3TFT through solution treatment which protects the device and improves its performance. We performed electronic characterization of In2O3with different solute weight ratio PTFT passivation layer, analyzed the types and contents of the constituent elements in the micro area of the material by energy dispersive spectrometry and observed the dynamic and static response of the inverter drive. Got a proper conversion effect. It is concluded that the appropriate solute weight ratio of the PTFE passivation layer is helpful to improve the various electronic characteristics of the In2O3TFT and the relative content of each element under the optimal state.
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