低功率凸源双栅极TFET的解析建模与仿真

Bijoy Goswami, Debadipta Basak, A. Bhattacharya, Koelgeet Kaur, Sutanni Bhowmick, S. Sarkar
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引用次数: 1

摘要

本文建立了22nm凸源双栅极TFET (SS-DG-TFET)的表面电位分析模型。表面电位作为性能参数进行了分析,并对改进的开/关电流比进行了评估。在相同的前后栅极偏压和相同的氧化层厚度条件下,研究了隧道电流的变化。为了提高通道区域的电导率,源区域在两个方向上进行了对称扩展,并在该模型中得到了有效的部署。该模型还建立了低功耗功能和低亚阈值斜率的执行。分析结果已通过Silvaco、Atlas进行了适当的验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analytical Modeling and Simulation of Low Power Salient Source Double Gate TFET
The analytical surface potential model of 22nm salient source Double Gate TFET (SS-DG-TFET) is presented in this paper. The surface potential is analyzed as the performance parameter along with an assessment of improved ON/ OFF current ratio. The variation of tunnel current is examined under same front and back gate bias together with identical oxide thickness. The source region has been extended symmetrically in both directions in order to enhance the conductivity of the channel region and it has been efficiently deployed in the proposed model. The execution of low power functionality and lower sub-threshold slope is also established in this model. The analytical results have been suitably validated using Silvaco, Atlas.
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