利用原子层沉积技术裁剪氧化薄膜异质结构中的二维电子气体密度

S. H. Kim, Hye Ju Kim, Sang Woon Lee
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引用次数: 0

摘要

近年来,基于氧化物异质结构的二维电子气体(2DEG)由于其有趣的性质受到了广泛的关注。模型系统是生长在单晶SrTiO3 (STO)衬底上的外延LaAlO3 (LAO)。[1]观察到密度为10~10/cm的电子沿面内方向自由运动,而被限制在~2 nm(面外方向)内。遗憾的是,对于外延的LAO/STO异质结构,电子密度的调节是不可用的。此外,外延型LAO薄膜的生长需要采用脉冲激光沉积技术的高温工艺(700 ~ 800℃)。在这里,我们展示了利用原子层沉积(ALD)在非外延Al2O3/TiO2薄膜异质结构的界面上产生和控制2DEG。由于电子来自Al2O3/TiO2异质结构界面上的氧空位,在ALD过程中氧空位密度受动力学控制,因此通过控制ALD过程温度可以将电子密度从~ 10/cm调整到~ 10/cm。Al2O3/TiO2异质结界面的电子密度高达~10/cm,是传统半导体异质结(如AlGaAs/GaAs)的100倍。2DEG at Al2O3/TiO2异质结构可用于研制氢气(H2)气体传感器。高性能、透明、极薄(3.2 eV)在可见光谱中的透射率为83%,这使得透明传感器成为可能。Pd/Al2O3/TiO2气体传感器在室温下也能快速检测H2气体,响应时间短,小于30s,优于传统的H2气体传感器。该传感器对H2浓度的响应范围很广,特别是在~ 5ppm到1%的范围内,这意味着它是一个很有希望的通用H2传感器的候选者。有趣的是,由于2DEG在Al2O3/TiO2异质结构上的剪裁能力,Pd/Al2O3/TiO2气体传感器显示出H2检测的最佳电子密度。特别是,当电子密度为5.6 × 10 cm时,灵敏度低至3%,而当电子密度从5.6 × 10 cm降低到4.1 × 10 cm时,灵敏度从6%提高到43%。除了传感器的应用外,还将介绍2DEG的其他应用。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Tailoring of Two-dimensional Electron Gas Density in Thin Film Oxide Heterostructure via Atomic Layer Deposition
Extended Abstract Recently, oxide heterostructure-based two-dimensional electron gas (2DEG) has received intensive attentions owing to their interesting properties. The model system is epitaxial LaAlO3 (LAO) grown on single crystalline SrTiO3 (STO) substrate.[1] Electrons with a density of 10~10/cm were observed which moves freely along in-plane direction while they are confined within ~2 nm (out-of-plane direction). Unfortunately, the adjustment of electron density was not available for the epitaxial LAO/STO heterostructure. In addition, the growth of epitaxial LAO film requires a high-temperature process (700 ~ 800°C) using pulsed laser deposition technique. Here, we demonstrated a creation and control of 2DEG at the interface of non-epitaxial Al2O3/TiO2 thin film heterostructure using atomic layer deposition (ALD). The electron density can be tailored from ~ 10/cm to ~ 10/cm by the control of ALD process temperature because the electrons are coming from oxygen vacancies at the interface of Al2O3/TiO2 heterostructure of which oxygen vacancy density is governed by kinetics during the ALD process. Electron density up to ~10/cm was achieved at the interface of the Al2O3/TiO2 heterostructure which is 100 times higher than that of the conventional semiconductor heterojunction such as AlGaAs/GaAs. The 2DEG at Al2O3/TiO2 heterostructure can be applied for the development hydrogen (H2) gas sensor. A highperformance, transparent, and extremely thin (<15 nm) hydrogen gas sensor was fabricated using 2DEG at the interface of Al2O3/TiO2 heterostructure grown by ALD. [2] Palladium nanoparticles (≈2 nm in thickness) are used on the surface of the Al2O3/TiO2 thin film heterostructure to detect H2. Both oxides with a wide bandgap (>3.2 eV) have transmittance of 83% in the visible spectrum, which allows for a transparent sensor. The Pd/Al2O3/TiO2 gas senor detects H2 gas quickly with a short response time of <30 s even at room temperature which outperforms conventional H2 gas sensors. This sensor responds to a wide range of H2 concentration, especially from ~5 ppm to 1%, implying a promising candidate for a general H2 sensor. Interestingly, the Pd/Al2O3/TiO2 gas senor showed an optimal electron density for H2 detection owing to the tailoring ability of 2DEG at the Al2O3/TiO2 heterostructure. Particularly, a sensitivity was as low as 3% for a 2DEG density of 5.6 × 10 cm while the sensitivity was improved from 6% to 43% as the electron density decreased from 5.6 × 10 cm to 4.1 × 10 cm. Besides the sensor application, other application of 2DEG will be introduced in the presentation.
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