{"title":"硅射频集成电路中螺旋电感衬底损耗建模","authors":"W. Kuhn, N. Yanduru","doi":"10.1109/RAWCON.1998.709197","DOIUrl":null,"url":null,"abstract":"Spiral inductors constructed in silicon IC technologies possess limited quality factors due to series resistive losses, and losses within the semiconducting substrate. A new model for the less understood substrate losses illustrates how these losses can be minimized, providing quality factor increases of up to 230 percent over un-optimized designs.","PeriodicalId":226788,"journal":{"name":"Proceedings RAWCON 98. 1998 IEEE Radio and Wireless Conference (Cat. No.98EX194)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-08-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"54","resultStr":"{\"title\":\"Spiral inductor substrate loss modeling in silicon RF ICs\",\"authors\":\"W. Kuhn, N. Yanduru\",\"doi\":\"10.1109/RAWCON.1998.709197\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Spiral inductors constructed in silicon IC technologies possess limited quality factors due to series resistive losses, and losses within the semiconducting substrate. A new model for the less understood substrate losses illustrates how these losses can be minimized, providing quality factor increases of up to 230 percent over un-optimized designs.\",\"PeriodicalId\":226788,\"journal\":{\"name\":\"Proceedings RAWCON 98. 1998 IEEE Radio and Wireless Conference (Cat. No.98EX194)\",\"volume\":\"7 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-08-09\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"54\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings RAWCON 98. 1998 IEEE Radio and Wireless Conference (Cat. No.98EX194)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/RAWCON.1998.709197\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings RAWCON 98. 1998 IEEE Radio and Wireless Conference (Cat. No.98EX194)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/RAWCON.1998.709197","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Spiral inductor substrate loss modeling in silicon RF ICs
Spiral inductors constructed in silicon IC technologies possess limited quality factors due to series resistive losses, and losses within the semiconducting substrate. A new model for the less understood substrate losses illustrates how these losses can be minimized, providing quality factor increases of up to 230 percent over un-optimized designs.