铋掺杂GaSb的光致发光特性

M. Kučera, J. Novák
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引用次数: 2

摘要

本文报道了双区行热法制备掺铋锑化镓的光致发光特性。对样品进行了详细的PL检查,包括探测各种表面区域和PL温度和泵强度的依赖关系。在650/spl度/C下生长的材料中,光谱表征方法证明了PL峰的显著位移和带隙缩小(BGN),这很可能是由样品内部的张力引起的。在420/spl℃下生长的材料表现出非常不均匀的发光特性。晶体/种子界面附近的部分晶体显示出几乎纯的激子光谱和GaSb原生受体(NA)的强烈还原。在远离界面的区域,研究了高掺杂和高补偿半导体的PL特征。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photoluminescence characterisation of bismuth-doped GaSb
The paper reports on a photoluminescence (PL) characterisation of bismuth-doped gallium antimonide prepared by a travelling heater method (THM) with a Bi-zone. Detailed PL inspection of samples was done, including probing of various surface regions and PL temperature and pump intensity dependencies. In the material grown at 650/spl deg/C significant shifts of PL peaks and the band-gap narrowing (BGN) were proved by spectral characterisation methods, and caused most likely by tension inside the sample. Material grown at 420/spl deg/C exhibited very non-uniform luminescent properties. A part of the crystal near the crystal/seed interface showed almost pure excitonic spectra and a strong reduction of the GaSb native acceptor (NA). In regions distant from the interface PL features characteristic for a highly doped and compensated semiconductor were inspected.
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