管理和控制污染在先进的8”CMOS试点线

K. De Backker, W. Deweerd, H. Lebon
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摘要

在本文中,我们将详细介绍在IMECs 1类研发工厂建立的经验,该经验基于污染控制方案,该方案允许在单个工具库中安全同时引入大量污染物,并且只需要有限的污染专用工具分配手段。重点将放在铜/低钾的相关研究上。我们会详细介绍各方面的情况,包括所采用的规格、运作策略和分配、各种污染物的分类方案,以及长期监测。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Managing and controlling contamination in an advanced 8" CMOS pilot line
In this paper we will elaborate on experience that has been built up at IMECs class 1 R&D fab, based on a scheme for contamination control that allows to safely and simultaneously introduce a multitude of contaminants in a single tool park and requiring only limited means of contamination dedicated tool allocation. Emphasis will be put on Cu/low k related research. Details will be given on various aspects, ranging from the employed specs, operational strategy and allocation, over classification schemes for various contaminants, to long-term monitoring.
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