{"title":"管理和控制污染在先进的8”CMOS试点线","authors":"K. De Backker, W. Deweerd, H. Lebon","doi":"10.1109/ISSM.2001.963006","DOIUrl":null,"url":null,"abstract":"In this paper we will elaborate on experience that has been built up at IMECs class 1 R&D fab, based on a scheme for contamination control that allows to safely and simultaneously introduce a multitude of contaminants in a single tool park and requiring only limited means of contamination dedicated tool allocation. Emphasis will be put on Cu/low k related research. Details will be given on various aspects, ranging from the employed specs, operational strategy and allocation, over classification schemes for various contaminants, to long-term monitoring.","PeriodicalId":356225,"journal":{"name":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","volume":"35 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2001-10-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Managing and controlling contamination in an advanced 8\\\" CMOS pilot line\",\"authors\":\"K. De Backker, W. Deweerd, H. Lebon\",\"doi\":\"10.1109/ISSM.2001.963006\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"In this paper we will elaborate on experience that has been built up at IMECs class 1 R&D fab, based on a scheme for contamination control that allows to safely and simultaneously introduce a multitude of contaminants in a single tool park and requiring only limited means of contamination dedicated tool allocation. Emphasis will be put on Cu/low k related research. Details will be given on various aspects, ranging from the employed specs, operational strategy and allocation, over classification schemes for various contaminants, to long-term monitoring.\",\"PeriodicalId\":356225,\"journal\":{\"name\":\"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)\",\"volume\":\"35 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2001-10-08\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ISSM.2001.963006\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2001 IEEE International Symposium on Semiconductor Manufacturing. ISSM 2001. Conference Proceedings (Cat. No.01CH37203)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ISSM.2001.963006","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Managing and controlling contamination in an advanced 8" CMOS pilot line
In this paper we will elaborate on experience that has been built up at IMECs class 1 R&D fab, based on a scheme for contamination control that allows to safely and simultaneously introduce a multitude of contaminants in a single tool park and requiring only limited means of contamination dedicated tool allocation. Emphasis will be put on Cu/low k related research. Details will be given on various aspects, ranging from the employed specs, operational strategy and allocation, over classification schemes for various contaminants, to long-term monitoring.