LP-MOVPE控制GaInAs/InP MQW和GaInAsP/GaInAs分离约束MQW激光结构的生长

D. Grutzmacher, J. Hergeth, M. Glade, K. Wolter, F. Reinhardt, F. Fidorra, P. Wolfram, P. Balk
{"title":"LP-MOVPE控制GaInAs/InP MQW和GaInAsP/GaInAs分离约束MQW激光结构的生长","authors":"D. Grutzmacher, J. Hergeth, M. Glade, K. Wolter, F. Reinhardt, F. Fidorra, P. Wolfram, P. Balk","doi":"10.1109/ICIPRM.1990.203030","DOIUrl":null,"url":null,"abstract":"Using a low-pressure MOVPE growth process for GaInAs/InP and GaInAs/GaInAsP multiple-quantum-well (MQW) lasers, stringent requirements for interface abruptness and the diffusion of the p-type dopant, among others, were met. In the optimized growth process the well width is controlled in fractions of one monolayer and the diffusion coefficient of Zn is reduced to 6.5*10/sup -14/ cm/sup 2//s. Failure to improve the laser characteristics by replacing the GaInAsP active layer by a GaInAs/InP MQW is caused by inefficient heavy hole injection across the InP barriers. For lasers containing four GaInAs wells, threshold current density as low as 0.61 kA/cm/sup 2/ (L=800 mu m) was observed.<<ETX>>","PeriodicalId":138960,"journal":{"name":"International Conference on Indium Phosphide and Related Materials","volume":"36 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1990-04-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Controlled growth of GaInAs/InP MQW and GaInAsP/GaInAs separate confinement MQW laser structures by LP-MOVPE\",\"authors\":\"D. Grutzmacher, J. Hergeth, M. Glade, K. Wolter, F. Reinhardt, F. Fidorra, P. Wolfram, P. Balk\",\"doi\":\"10.1109/ICIPRM.1990.203030\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Using a low-pressure MOVPE growth process for GaInAs/InP and GaInAs/GaInAsP multiple-quantum-well (MQW) lasers, stringent requirements for interface abruptness and the diffusion of the p-type dopant, among others, were met. In the optimized growth process the well width is controlled in fractions of one monolayer and the diffusion coefficient of Zn is reduced to 6.5*10/sup -14/ cm/sup 2//s. Failure to improve the laser characteristics by replacing the GaInAsP active layer by a GaInAs/InP MQW is caused by inefficient heavy hole injection across the InP barriers. For lasers containing four GaInAs wells, threshold current density as low as 0.61 kA/cm/sup 2/ (L=800 mu m) was observed.<<ETX>>\",\"PeriodicalId\":138960,\"journal\":{\"name\":\"International Conference on Indium Phosphide and Related Materials\",\"volume\":\"36 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1990-04-23\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"International Conference on Indium Phosphide and Related Materials\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ICIPRM.1990.203030\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"International Conference on Indium Phosphide and Related Materials","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ICIPRM.1990.203030","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 1

摘要

采用低压MOVPE生长工艺制备GaInAs/InP和GaInAs/GaInAsP多量子阱(MQW)激光器,满足了对界面陡度和p型掺杂物扩散等方面的严格要求。在优化后的生长过程中,井宽被控制在单个单层的分数段内,锌的扩散系数降低到6.5 × 10/sup ~ 14/ cm/sup 2/ s。用GaInAs/InP MQW取代GaInAsP有源层无法改善激光特性,主要原因是InP势垒上的重空穴注入效率低下。对于含有四个GaInAs阱的激光器,观察到阈值电流密度低至0.61 kA/cm/sup 2/ (L=800 μ m)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Controlled growth of GaInAs/InP MQW and GaInAsP/GaInAs separate confinement MQW laser structures by LP-MOVPE
Using a low-pressure MOVPE growth process for GaInAs/InP and GaInAs/GaInAsP multiple-quantum-well (MQW) lasers, stringent requirements for interface abruptness and the diffusion of the p-type dopant, among others, were met. In the optimized growth process the well width is controlled in fractions of one monolayer and the diffusion coefficient of Zn is reduced to 6.5*10/sup -14/ cm/sup 2//s. Failure to improve the laser characteristics by replacing the GaInAsP active layer by a GaInAs/InP MQW is caused by inefficient heavy hole injection across the InP barriers. For lasers containing four GaInAs wells, threshold current density as low as 0.61 kA/cm/sup 2/ (L=800 mu m) was observed.<>
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信