溅射沉积Ta/Si软x射线多层反射镜

Shao Jianda, Fan Zhengxiu
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引用次数: 0

摘要

采用平面磁控溅射法制备了30层Ta/Si交替结构,用于234A x射线反射镜。其特性表明,实际反射率有望达到10%左右。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Sputtering Deposited Ta/Si Soft X-ray Multilayer Mirror
30 layers of Ta/Si alternative structure prepared by plane magneton sputtering has been ehoosen for 234A x-ray mirror. Its characterizations indicated that it is expected to get the real reflectivity of about 10%.
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