低掺杂衬底面积对EFT事件下电路可靠性的影响

R. Secareanu, O. Hartin, J. Feddeler, R. Moseley, J. Shepherd, B. Vrignon, Jian Yang, Qiang Li, Hongwei Zhao, Waley Li, Linpeng Wei, E. Salman, Richard Wang, D. Blomberg, P. Parris
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引用次数: 2

摘要

外部应力,如由电快速瞬变(EFT)事件产生的应力,产生过电压,可能导致IC级的可靠性故障,以IC的可恢复或永久损坏的形式。在本文中,讨论了设计框架内的技术特征与这种EFT事件可能产生的永久故障之间的关系。提出了尽量减少此类EFT事件影响的解决方案。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Impact of low-doped substrate areas on the reliability of circuits subject to EFT events
External stresses, such as those generated due to Electrical Fast Transient (EFT) events, generate over-voltages which may result in reliability failures at the IClevel either in the form of recoverable or permanent damage of the IC. In the present paper, the relationship between the technology characteristics within a design framework and the permanent failures that such an EFT event can produce are discussed. Solutions to minimize the impact of such EFT events are presented.
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