稀土掺杂si基薄膜材料的光致发光性能

Qingnian Wang, Meiling Yuan, Xinli Leng
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引用次数: 0

摘要

用离子注入法测量了掺钕硅基样品的室温光致发光光谱。结果表明,所有样品在紫外光激发下均具有蓝紫光致发光特性,且发光稳定。PL光谱的强度与注入剂量和热退火温度密切相关。对上述样品进行了阳极氧化处理。测定了经HNO3处理的多孔样品的PL光谱。结果表明,在相同的测量条件下,经电化学阳极腐蚀和HNO3处理的多孔样品的发光效率高于普通PS样品。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photoluminescence properties of rare-earth doped Si-based films materials
The photoluminescence (PL) spectra at room temperature for the silicon-based samples doped by Nd by ion implantation are measured. The results show that all the samples possess blue-violet photoluminescence properties under the ultraviolet light excitation and its light emission is stable. The intensity of PL spectra is closely relative to the dose of implantation and to the temperature of thermal annealing.The above samples were treated by anodization method. The PL spectra of porous samples which were treated by HNO3 were measured. The results show light emission efficiency of the porous samples that were treated by electro-chemical anodization etch and HNO3 is higher than those of ordinary PS samples under the same measuring conditions.
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