电子束记录的进一步进展

2000 Optical Data Storage. Conference Digest (Cat. No.00TH8491) Pub Date : 1900-01-01 DOI:10.1117/12.399334

G. Reynolds

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引用次数: 5

摘要

最初的工艺试验集中在制造连续槽结构上。这使得电子束控制系统的机械稳定性和光束稳定性得到充分的评估。对不同的抗蚀剂和显影剂的工艺条件进行了评价。然而，与电子束光刻不同，对于光盘母版来说，必须能够控制薄抗蚀剂层中特征边缘的斜率，这使得抗蚀剂和工艺条件的选择更加关键。

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Further advances in electron beam recording

Initial process trials have concentrated on making continuous groove structures. This allows the mechanical and beam stability of the electron beam mastering system to be fully evaluated. The process conditions for different resists and developers have been evaluated. However, unlike e-beam lithography, for optical disc mastering it is essential to be able to control the slope of feature edges in thin resist layers making the choice of resist and process conditions even more critical.

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2000 Optical Data Storage. Conference Digest (Cat. No.00TH8491)

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