InP和InAs/InP异质结构的原子层外延

C. Tran, R. Masut, J. Brebner, M. Jouanne, R. Leonelli
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引用次数: 0

摘要

本研究使用的样品是InAs/InP应变单量子阱和原子层外延(ALE)生长的应变超晶格(SLS)。InAs在InP上的生长受到较大的晶格失配(3.22%)的强烈影响。进行了高分辨率x射线衍射(HRXRD)。HRXRD可以快速准确地评价InP和InAs的ALE自限生长速率。利用x射线波场的干涉,在有InAs标记层的ALE生长的InP中,作者准确地确定了每个周期的生长。AL生长的InAs/InP SLSs的拉曼光谱清楚地显示了InAs和InP层的纵向声学折叠模式和纵向光学受限模式。结果表明,尽管存在3.2%的晶格失配,但ALE是制造具有原子控制异质界面的高应变InAs/InP结构的有力方法。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Atomic layer epitaxy of InP and InAs/InP heterostructures
The samples used for this study were InAs/InP strained single quantum wells and strained superlattices (SLS) grown by atomic layer epitaxy (ALE). The growth of InAs on InP is strongly influenced by the large lattice mismatch (3.22%). High resolution X-ray diffraction (HRXRD) was carried out. HRXRD can be used to quickly and precisely evaluate the ALE self-limiting growth rate of both InP and InAs. Using interference of X-ray wave fields in a ALE grown InP with an InAs marker layer the authors have accurately determined the growth per cycle. Raman spectra of AL grown InAs/InP SLSs show clearly the longitudinal acoustical folded modes and the longitudinal optic confined modes for both InAs and InP layers. The results indicate that despite the 3.2% lattice mismatch, ALE is a powerful method for fabricating highly strained InAs/InP structures with atomically controlled heterointerfaces.<>
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