{"title":"提高产量的新路由和压实策略","authors":"V. Chiluvuri, I. Koren","doi":"10.1109/DFTVS.1992.224342","DOIUrl":null,"url":null,"abstract":"Improvements in manufacturing lines alone can not compensate for the yield losses due to the increase in complexity of logic. Manufacturing yield improvement needs to be addressed during the physical layout synthesis stage itself. Several layout strategies for yield enhancement are proposed and they are illustrated with respect to channel compaction and routing in standard cell design. Algorithms and other implementation issues are discussed and examples illustrating these algorithms are presented.<<ETX>>","PeriodicalId":319218,"journal":{"name":"Proceedings 1992 IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems","volume":"11 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1992-11-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"25","resultStr":"{\"title\":\"New routing and compaction strategies for yield enhancement\",\"authors\":\"V. Chiluvuri, I. Koren\",\"doi\":\"10.1109/DFTVS.1992.224342\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Improvements in manufacturing lines alone can not compensate for the yield losses due to the increase in complexity of logic. Manufacturing yield improvement needs to be addressed during the physical layout synthesis stage itself. Several layout strategies for yield enhancement are proposed and they are illustrated with respect to channel compaction and routing in standard cell design. Algorithms and other implementation issues are discussed and examples illustrating these algorithms are presented.<<ETX>>\",\"PeriodicalId\":319218,\"journal\":{\"name\":\"Proceedings 1992 IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems\",\"volume\":\"11 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1992-11-04\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"25\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceedings 1992 IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/DFTVS.1992.224342\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceedings 1992 IEEE International Workshop on Defect and Fault Tolerance in VLSI Systems","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/DFTVS.1992.224342","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
New routing and compaction strategies for yield enhancement
Improvements in manufacturing lines alone can not compensate for the yield losses due to the increase in complexity of logic. Manufacturing yield improvement needs to be addressed during the physical layout synthesis stage itself. Several layout strategies for yield enhancement are proposed and they are illustrated with respect to channel compaction and routing in standard cell design. Algorithms and other implementation issues are discussed and examples illustrating these algorithms are presented.<>