压纹玻璃基板上硅薄膜的光捕获和反射控制

P. Campbell, M. Keevers
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引用次数: 10

摘要

描述了一种适用于5-20 /spl mu/m厚多晶硅太阳能电池的压纹金字塔状玻璃衬底结构。采用具有倒金字塔纹理的单晶硅片作为模具。我们评估了未掺杂的a-Si:H硅薄膜(体积厚度5.6 /spl mu/m;无反射器)同时沉积在这种纹理和喷砂玻璃上,使用全反射率和透射率测量。在相同的衬底上,同样厚的多晶硅薄膜的光捕获增强电位估计为6.7(喷砂),8.7(压纹)mA/cm/sup /。通过光谱光导测量得到的样品的光捕获特性进行了比较。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Light trapping and reflection control for silicon thin films deposited on glass substrates textured by embossing
A glass substrate texture of pyramids formed by embossing, suitable for polycrystalline silicon solar cells 5-20 /spl mu/m thick, is described. A monocrystalline silicon wafer textured with inverted pyramids was used as a die. We evaluate antireflection and light trapping properties for an undoped a-Si:H silicon film (volumetric thickness 5.6 /spl mu/m; no reflector) simultaneously deposited on this texture and sandblasted glass, using total reflectance and transmittance measurements. J/sub sc/ enhancement potential from light trapping in equally thick polycrystalline silicon films on the same substrates is estimated to be 6.7 (sandblasted), 8.7 (embossed) mA/cm/sup 2/. Light trapping characteristics obtained by spectral photoconductance measurements of the specimens are compared.
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