{"title":"利用基板倾斜角度控制的快速原子束制造高效燃烧光栅","authors":"Chabum Lee, K. Hane, Sun-Kyu Lee","doi":"10.1109/OMEMS.2010.5672141","DOIUrl":null,"url":null,"abstract":"This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6–1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.","PeriodicalId":421895,"journal":{"name":"2010 International Conference on Optical MEMS and Nanophotonics","volume":"2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2010-12-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Fast atom beam-based fabrication of high-efficienct blazed grating using slanting angle control of a substrate\",\"authors\":\"Chabum Lee, K. Hane, Sun-Kyu Lee\",\"doi\":\"10.1109/OMEMS.2010.5672141\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6–1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.\",\"PeriodicalId\":421895,\"journal\":{\"name\":\"2010 International Conference on Optical MEMS and Nanophotonics\",\"volume\":\"2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2010-12-17\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2010 International Conference on Optical MEMS and Nanophotonics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/OMEMS.2010.5672141\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2010 International Conference on Optical MEMS and Nanophotonics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/OMEMS.2010.5672141","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Fast atom beam-based fabrication of high-efficienct blazed grating using slanting angle control of a substrate
This paper presents electromagnetic analysis of Si-based small period blazed reflection gratings for a period of 0.6–1.5 μm in terms of the rigorous coupled wave analysis (RCWA) and its fabrication using fast atom beam (FAB) etching method. The optimized blazed gratings were successfully fabricated on a slanted silicon substrate by FAB etching method, and diffraction efficiencies (DE) for four kinds of gratings were evaluated from optical testing and these results showed good agreement with these theoretical values, respectively.
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