环氧-铜界面牵拉-位移关系的分子动力学研究

C. K. Wong, S. Y. Y. Leung, R. Poelma, K. Jansen, C. Yuan, W. V. van Driel, G. Zhang
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引用次数: 2

摘要

用原子模型研究了环氧树脂-铜界面的牵引-位移关系。在分子动力学模拟中,计算了界面位移对环氧层反作用力的响应。从位移速率和位移增量步长两个方面进行了参数化研究。牵引力-位移关系对位移增量的步长很敏感。在环氧-铜界面紧密接触的初始区域,位移增量较小,可以更好地描述牵引力-位移关系。牵引力-位移模型计算得到的界面能为- 0.28 Jm - 2,与静态模型计算得到的界面能相当。该计算值也接近文献[1]中报道的环氧-铜体系的粘接热力学功(- 0.26 Jm - 2)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Molecular Dynamics study of the traction-displacement relations of epoxy-copper interfaces
The traction-displacement relations of the epoxy-copper interfaces are studied using an atomistic model. The reaction force of the epoxy layer in response to displacement of the interface is calculated during molecular dynamics simulation. A parametric study in terms of displacement rate and the step size of displacement increment has been performed. The traction-displacement relations are found sensitive to the step size of the displacement increment. The traction-displacement relations are better described with a small displacement increment in the initial region where the epoxy-copper interface is in close contact. The interfacial energy as calculated by the traction-displacement model is −0.28 Jm−2 which is comparable to the value obtained from a static model. This calculated value is also close to the thermodynamic work of adhesion (−0.26 Jm−2) of an epoxy-copper system as reported in the literature [1].
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