采用生产GaAs/AlGaAs HBT工艺制造的高性能单片IC的可靠性

F. Yamada, A. Oki, D. Streit, Y. Saito, A. R. Coulson, W.C. Atwood, E. Rezek
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引用次数: 3

摘要

我们报告了世界上第一个使用GaAs/AlGaAs异质结双极晶体管(HBT)技术制造的单片集成电路的寿命测试结果。采用连续检测对数放大器(SDLA)作为标准评价电路(SEC)对HBT过程进行评价。三温恒应力寿命试验结果表明,在结温125/spl下,平均失效时间(MTF)为10/ 7/小时,活化能(Ea)为1.4 eV, log-sigma (/spl sigma/)为0.7。失效标准基于SDLA的RF和DC特性。并对失效模式进行了讨论。本研究确立了GaAs/AlGaAs HBT技术是一种成熟可靠的工艺技术。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Reliability of a high performance monolithic IC fabricated using a production GaAs/AlGaAs HBT process
We report the world's first lifetest results of a monolithic integrated circuit fabricated using GaAs/AlGaAs Heterojunction Bipolar Transistor (HBT) technology. The Successive Detection Logarithmic Amplifier (SDLA) was used as the standard evaluation circuit (SEC) to evaluate the HBT process. Results of a three temperature constant stress lifetest projects a median-time-to-failure (MTF) of >10/sup 7/ hours at 125/spl deg/C junction temperature with an activation energy (Ea) of 1.4 eV and log-sigma (/spl sigma/) of 0.7. Failure criteria were based on RF and DC characteristics of the SDLA. Failure mode is also discussed. This study establishes GaAs/AlGaAs HBT technology as a mature and reliable process technology.
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