原子层沉积生长富氮TiO2纳米膜的大三阶非线性

2020 IEEE Research and Applications of Photonics in Defense Conference (RAPID) Pub Date : 2020-08-01 DOI:10.1109/RAPID49481.2020.9195674

R. Kuis, T. Gougousi, Isaac Basaldua, Paul Burkins, J. A. Kropp, A. Johnson

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引用次数: 0

摘要

非线性折射率，n2，值高达1±。在原子层沉积(ALD)生长的TiO2纳米级薄膜中，使用飞秒热管理z扫描测量了1x10-9 cm2/W。n2的几个数量级的增加被认为是由于生长过程中氮的掺入。

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Large Third-Order Nonlinearities in Atomic Layer Deposition Grown Nitrogen-Enriched TiO2 Nanoscale Films

Nonlinear refractive index, n2, values as high as 1±.1x10^-9 cm²/W were measured in atomic layer deposition (ALD) grown TiO2 nanoscale films, using femtosecond thermally managed Z-scan. The several order of magnitude increase in n2 is believed due to the incorporation of nitrogen during growth.

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2020 IEEE Research and Applications of Photonics in Defense Conference (RAPID)

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