用于65nm CMOS亚vt存储器的0.28-0.8V 320fw d锁存器

B. Mohammadi, O. Andersson, P. Meinerzhagen, Y. Sherazi, A. Burg, J. Rodrigues
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引用次数: 3

摘要

提出了一种适用于65nm CMOS亚阈值标准单元存储器的超低漏锁存器设计。在泄漏、面积和速度方面比较了各种锁存器架构。漏效率最高的结构是通过晶体管堆叠和通道长度拉伸来优化的。最后的设计补充了一个3状态输出缓冲器,以在内存应用中提供低泄漏读取功能。硅测量证实了仿真结果,包括基于蒙特卡罗仿真的可靠性分析。锁存器在280mV电压下完全工作,在220mV电源电压下保持数据,仅消耗230fW泄漏功率。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 0.28-0.8V 320 fW D-latch for sub-VT memories in 65 nm CMOS
The design of an ultra-low-leakage latch, suitable for subthreshold standard-cell based memories in 65nm CMOS is presented. Various latch architectures are compared in terms of leakage, area and speed. The most leakage-efficient architecture is optimized by transistor stacking and channel length stretching. The final design is supplemented with a 3-state output buffer to provide low-leakage read functionality in memory applications. Silicon measurements confirm simulation results including the reliability analysis based on Monte-Carlo simulations. The latch is fully functional at 280mV and retains data down to a supply voltage of 220mV, consuming as little as 230fW leakage power.
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