饱和13.2 nm高重复率激光在类镍镉和等电子缩尺降至10.9 nm

2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference Pub Date : 2006-05-21 DOI:10.1109/CLEO.2006.4628454

B. Luther, Y. Wang, M. Larotonda, D. Alessi, M. Berrill, V. Shlyaptsev, J. Rocca

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引用次数: 0

摘要

用台式λ = 13.2 nm、平均功率为1 muW的软x射线激光器，以5赫兹的重复频率在类镍镉中进行了实验。在其他类镍离子的跃迁中也获得了低至10.9 nm的激光。

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Saturated 13.2 nm high repetition rate laser in nickel-like Cd and isoelectronic scaling down to 10.9 nm

A table-top lambda = 13.2 nm soft X-ray laser operating at 5 Hertz repetition rate with 1 muW average power was demonstrated in Ni-like Cd. Lasing down to 10.9 nm was also obtained in transitions of other Ni-like ions.

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2006 Conference on Lasers and Electro-Optics and 2006 Quantum Electronics and Laser Science Conference

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