具有结构缺陷的Si晶体在lae几何中的x射线散射动力学效应

April 16 Pub Date : 1984-04-16 DOI:10.1002/PSSA.2210820204
N. Olekhnovich, A. L. Karpei
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引用次数: 2

摘要

本文报道了无位错含氧硅晶体中x射线积分强度的厚度振荡和面偏振MoKα辐射在劳埃几何中的异常透射的研究结果。确定了111、333、444和555反射的静态德拜-沃勒系数(E = exp (-L))和散射吸收系数(μd)。比较了In E对h2 + k2 + l2的实验依赖与理论依赖,得出了结构缺陷为团簇的结论。利用比值L/μd估计聚类半径。晶体退火后,其值基本不变或略有下降,而团簇中的缺陷密度增加。测量到的反射的综合强度分为相干分量和漫射分量。在漫射分量中发现了反常的透射效应。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Dynamical Effects of X-Ray Scattering in Laue Geometry for Si Crystals with Structure Defects
Results of an investigation of thickness oscillations of the X-ray integrated intensity and anomalous transmission of plane-polarized MoKα radiation in the Laue geometry for dislocation-free silicon crystals containing oxygen are reported. The static Debye-Waller factor (E = exp (—L)) and the absorption coefficient due to the diffuse scattering (μd) for the 111, 333, 444 and 555 reflections are determined. From the comparison of the experimental dependence of In E on h2 + k2 + l2 with the theoretical one it is concluded that the structure defects are clusters. Using the ratio L/μd the cluster radius is estimated. Its value is found to be unchanged or little decreased after crystal annealing, while the defect density in the clusters increases. The measured integrated intensity of the reflections is divided into coherent and diffuse components. An anomalous trensmission effect is found for the diffuse component.
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