利用非对称掩模的旋转调制准直器的设计用于伽玛射线/中子双成像技术

Hyun Suk Kim, Gyemin Lee, S. Ye, Geehyun Kim
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引用次数: 3

摘要

我们目前正在开发一种基于旋转调制准直器(RMC)技术的双粒子成像仪,采用Cs2LiYCl6:Ce (CLYC)探测器。对称掩模设计通常用于RMC,然而,它有一个固有的问题,即不能区分相对于旋转轴定位的两个对称源。在本研究中,我们提出了一种新的准直掩模设计,以解决准直掩模对称模式在源定位估计中的伪影问题。我们使用蒙特卡罗N-Particle 6.1 (MCNP6)代码获得调制模式,并应用最大似然期望最大化(MLEM)算法从调制模式重建辐射图像。本文提出的非对称掩模设计通过去除对称掩模设计中的固有伪影,增强了图像重建的性能,并将作为双粒子RMC系统未来发展的基础设计。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design of a rotational modulation collimator utilizing asymmetric masks for the gamma-ray/neutron dual imaging technique
We are currently developing a dual-particle imager based on the rotational modulation collimator (RMC) technique employing Cs2LiYCl6:Ce (CLYC) detector. A symmetric mask design has been conventionally used for RMC, however, it has an intrinsic problem of not being able to distinguish two symmetric sources located with respect to the rotation axis. In the present study, we propose a new design of collimator masks to solve the artifact problem in the source location estimation imposed by the symmetric pattern of collimator masks. We used the Monte Carlo N-Particle 6.1 (MCNP6) code to obtain modulation patterns, and we applied the maximum likelihood expectation maximization (MLEM) algorithm to reconstruct radiation images from the modulation patterns. The asymmetric mask design we proposed in this paper showed enhanced performance in image reconstruction by removing intrinsic artifacts from the symmetric mask design and will be used as a fundamental design for the future development of the dual-particle RMC system.
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