G. Darbandy, J. Aghassi, J. Sedlmeir, U. Monga, I. Garduño, A. Cerdeira, B. Iñíguez
{"title":"双栅mosfet栅隧穿电流紧凑解析模型的温度依赖性","authors":"G. Darbandy, J. Aghassi, J. Sedlmeir, U. Monga, I. Garduño, A. Cerdeira, B. Iñíguez","doi":"10.1109/ULIS.2012.6193360","DOIUrl":null,"url":null,"abstract":"This paper presents Double Gate (DG) MOSFET models of the temperature dependences as part of a compact analytical model for the direct tunneling gate leakage and Trap-Assisted-Tunneling (TAT) current. We compare the adapted modeling calculations with experimental data of the gate leakage current in Trigate MOSFETs at various temperatures. The results of the direct tunneling current in the strong inversion regime and TAT in the subthreshold regime show good agreement with temperature dependent measurements with SiON as a gate oxide material. Our analysis above threshold voltage shows that the direct tunneling gate leakage current is clearly dominant over the TAT, while it is the opposite below threshold.","PeriodicalId":350544,"journal":{"name":"2012 13th International Conference on Ultimate Integration on Silicon (ULIS)","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2012-03-06","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":"{\"title\":\"Temperature dependence of compact analytical modeling of gate tunneling current in Double Gate MOSFETs\",\"authors\":\"G. Darbandy, J. Aghassi, J. Sedlmeir, U. Monga, I. Garduño, A. Cerdeira, B. Iñíguez\",\"doi\":\"10.1109/ULIS.2012.6193360\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents Double Gate (DG) MOSFET models of the temperature dependences as part of a compact analytical model for the direct tunneling gate leakage and Trap-Assisted-Tunneling (TAT) current. We compare the adapted modeling calculations with experimental data of the gate leakage current in Trigate MOSFETs at various temperatures. The results of the direct tunneling current in the strong inversion regime and TAT in the subthreshold regime show good agreement with temperature dependent measurements with SiON as a gate oxide material. Our analysis above threshold voltage shows that the direct tunneling gate leakage current is clearly dominant over the TAT, while it is the opposite below threshold.\",\"PeriodicalId\":350544,\"journal\":{\"name\":\"2012 13th International Conference on Ultimate Integration on Silicon (ULIS)\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2012-03-06\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"1\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2012 13th International Conference on Ultimate Integration on Silicon (ULIS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ULIS.2012.6193360\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2012 13th International Conference on Ultimate Integration on Silicon (ULIS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ULIS.2012.6193360","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Temperature dependence of compact analytical modeling of gate tunneling current in Double Gate MOSFETs
This paper presents Double Gate (DG) MOSFET models of the temperature dependences as part of a compact analytical model for the direct tunneling gate leakage and Trap-Assisted-Tunneling (TAT) current. We compare the adapted modeling calculations with experimental data of the gate leakage current in Trigate MOSFETs at various temperatures. The results of the direct tunneling current in the strong inversion regime and TAT in the subthreshold regime show good agreement with temperature dependent measurements with SiON as a gate oxide material. Our analysis above threshold voltage shows that the direct tunneling gate leakage current is clearly dominant over the TAT, while it is the opposite below threshold.