在0.18 /spl mu/m CMOS工艺下3.3 V RF应用(2 GHz)不同ESD保护策略的研究

C. Richier, Pascal Salome, G. Mabboux, I. Zaza, A. Juge, P. Mortini
{"title":"在0.18 /spl mu/m CMOS工艺下3.3 V RF应用(2 GHz)不同ESD保护策略的研究","authors":"C. Richier, Pascal Salome, G. Mabboux, I. Zaza, A. Juge, P. Mortini","doi":"10.1109/EOSESD.2000.890084","DOIUrl":null,"url":null,"abstract":"ESD protection for RF applications must deal with good ESD performance, minimum capacitance, zero series resistance and good capacitance linearity. In order to fulfil these requirements, different ESD protection strategies for RF applications have been investigated in a 0.18 /spl mu/m CMOS process. This paper compares different ESD protection devices and shows that a suitable ESD performance target for RF applications (200 fF max, 2 kV HBM) can be reached with a diode network scheme. The optimization of the diodes is then a key point which is detailed. A trade-off must be found between the ESD performance, the voltage drop during ESD and the parasitic capacitance. Poly as well as STI bounded diodes have been studied and it appears clearly that a solution based on poly bounded diodes is the best choice.","PeriodicalId":332394,"journal":{"name":"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)","volume":null,"pages":null},"PeriodicalIF":0.0000,"publicationDate":"2000-09-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"135","resultStr":"{\"title\":\"Investigation on different ESD protection strategies devoted to 3.3 V RF applications (2 GHz) in a 0.18 /spl mu/m CMOS process\",\"authors\":\"C. Richier, Pascal Salome, G. Mabboux, I. Zaza, A. Juge, P. Mortini\",\"doi\":\"10.1109/EOSESD.2000.890084\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"ESD protection for RF applications must deal with good ESD performance, minimum capacitance, zero series resistance and good capacitance linearity. In order to fulfil these requirements, different ESD protection strategies for RF applications have been investigated in a 0.18 /spl mu/m CMOS process. This paper compares different ESD protection devices and shows that a suitable ESD performance target for RF applications (200 fF max, 2 kV HBM) can be reached with a diode network scheme. The optimization of the diodes is then a key point which is detailed. A trade-off must be found between the ESD performance, the voltage drop during ESD and the parasitic capacitance. Poly as well as STI bounded diodes have been studied and it appears clearly that a solution based on poly bounded diodes is the best choice.\",\"PeriodicalId\":332394,\"journal\":{\"name\":\"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)\",\"volume\":null,\"pages\":null},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2000-09-26\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"135\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/EOSESD.2000.890084\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Electrical Overstress/Electrostatic Discharge Symposium Proceedings 2000 (IEEE Cat. No.00TH8476)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/EOSESD.2000.890084","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 135

摘要

射频应用中的ESD保护必须处理良好的ESD性能、最小的电容、零串联电阻和良好的电容线性。为了满足这些要求,在0.18 /spl mu/m CMOS工艺中研究了射频应用的不同ESD保护策略。本文比较了不同的ESD保护器件,表明采用二极管网络方案可以达到适合射频应用的ESD性能目标(最大200ff, 2kv HBM)。因此,二极管的优化是一个重点,这是详细的。必须在ESD性能、ESD期间的电压降和寄生电容之间找到一个权衡。对Poly和STI有界二极管进行了研究,显然基于Poly有界二极管的解决方案是最佳选择。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Investigation on different ESD protection strategies devoted to 3.3 V RF applications (2 GHz) in a 0.18 /spl mu/m CMOS process
ESD protection for RF applications must deal with good ESD performance, minimum capacitance, zero series resistance and good capacitance linearity. In order to fulfil these requirements, different ESD protection strategies for RF applications have been investigated in a 0.18 /spl mu/m CMOS process. This paper compares different ESD protection devices and shows that a suitable ESD performance target for RF applications (200 fF max, 2 kV HBM) can be reached with a diode network scheme. The optimization of the diodes is then a key point which is detailed. A trade-off must be found between the ESD performance, the voltage drop during ESD and the parasitic capacitance. Poly as well as STI bounded diodes have been studied and it appears clearly that a solution based on poly bounded diodes is the best choice.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信