掺硅铜扩散砷化镓深能级的表征研究及其对大块砷化镓开关的意义

L. M. Thomas, S. Panigrahi, V. Lakdawala
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引用次数: 0

摘要

对用于制造大块光控半导体开关的掺硅铜补偿砷化镓(GaAs:Si:Cu)进行了深入的表征研究。光导电流瞬态光谱技术已被用于识别GaAs:Si:Cu中存在的各种深能级,并从这些发现提出了GaAs中铜相关配合物的可能模型。研究了扩散参数对不同深铜层形成的影响。讨论了铜深电平(Cu/sub A/和Cu/sub B/)对开关性能的影响。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Characterization studies of deep levels in silicon doped copper diffused GaAs and their significance for bulk GaAs switches
Deep-level characterization studies have been carried out for silicon-doped copper-compensated gallium arsenide (GaAs:Si:Cu) which is used to fabricate bulk optically controlled semiconductor switches. A photoinduced current transient spectroscopy technique has been used to identify various deep levels present in GaAs:Si:Cu, and from the findings probable models for the copper-related complexes in GaAs are proposed. The effect of diffusion parameters on the formation of different copper deep levels has been studied. The influence of copper deep levels (Cu/sub A/ and Cu/sub B/) on switch performance is discussed.<>
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