45纳米SOI中2.5 db插入损耗、DC-60 GHz CMOS SPDT开关

M. Parlak, J. Buckwalter
{"title":"45纳米SOI中2.5 db插入损耗、DC-60 GHz CMOS SPDT开关","authors":"M. Parlak, J. Buckwalter","doi":"10.1109/CSICS.2011.6062463","DOIUrl":null,"url":null,"abstract":"This paper presents a single-pole double-throw (SPDT), transmit/receive (T/R) switch operating from DC to 60 GHz. The SPDT switch is based on a series-shunt circuit with broadband input and output matching circuits and is implemented in a partially-depleted, 45-nm silicon-on-insulator (SOI) process. A buried oxide (BOX) layer is demonstrated to minimize substrate coupling. The switch exhibits a measured insertion loss of less than 1.7 dB at 45 GHz and less than 2.5 dB at 60 GHz with an isolation of greater than 25 dB at 45 GHz. To our knowledge, this is the lowest insertion loss demonstrated for an SPDT switch at 60 GHz in a CMOS process. With a control voltage of 1.2 V, the measured P1dB and IIP3 are 7.1 dBm and 18.2 dBm, respectively. The active chip area is 0.18×0.22 mm2.","PeriodicalId":275064,"journal":{"name":"2011 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2011-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"52","resultStr":"{\"title\":\"A 2.5-dB Insertion Loss, DC-60 GHz CMOS SPDT Switch in 45-nm SOI\",\"authors\":\"M. Parlak, J. Buckwalter\",\"doi\":\"10.1109/CSICS.2011.6062463\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper presents a single-pole double-throw (SPDT), transmit/receive (T/R) switch operating from DC to 60 GHz. The SPDT switch is based on a series-shunt circuit with broadband input and output matching circuits and is implemented in a partially-depleted, 45-nm silicon-on-insulator (SOI) process. A buried oxide (BOX) layer is demonstrated to minimize substrate coupling. The switch exhibits a measured insertion loss of less than 1.7 dB at 45 GHz and less than 2.5 dB at 60 GHz with an isolation of greater than 25 dB at 45 GHz. To our knowledge, this is the lowest insertion loss demonstrated for an SPDT switch at 60 GHz in a CMOS process. With a control voltage of 1.2 V, the measured P1dB and IIP3 are 7.1 dBm and 18.2 dBm, respectively. The active chip area is 0.18×0.22 mm2.\",\"PeriodicalId\":275064,\"journal\":{\"name\":\"2011 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)\",\"volume\":\"1 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2011-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"52\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2011 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CSICS.2011.6062463\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2011 IEEE Compound Semiconductor Integrated Circuit Symposium (CSICS)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CSICS.2011.6062463","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 52

摘要

本文提出了一种单极双掷(SPDT)收发(T/R)开关,工作范围为直流至60 GHz。SPDT开关基于具有宽带输入和输出匹配电路的串联分流电路,采用部分耗尽的45纳米绝缘体上硅(SOI)工艺实现。埋藏氧化物(BOX)层被证明可以最小化衬底耦合。该开关在45 GHz时的测量插入损耗小于1.7 dB,在60 GHz时的测量插入损耗小于2.5 dB,在45 GHz时的隔离度大于25 dB。据我们所知,这是CMOS工艺中60 GHz SPDT开关的最低插入损耗。在控制电压为1.2 V时,测量到的P1dB和IIP3分别为7.1 dBm和18.2 dBm。有源芯片面积为0.18×0.22 mm2。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 2.5-dB Insertion Loss, DC-60 GHz CMOS SPDT Switch in 45-nm SOI
This paper presents a single-pole double-throw (SPDT), transmit/receive (T/R) switch operating from DC to 60 GHz. The SPDT switch is based on a series-shunt circuit with broadband input and output matching circuits and is implemented in a partially-depleted, 45-nm silicon-on-insulator (SOI) process. A buried oxide (BOX) layer is demonstrated to minimize substrate coupling. The switch exhibits a measured insertion loss of less than 1.7 dB at 45 GHz and less than 2.5 dB at 60 GHz with an isolation of greater than 25 dB at 45 GHz. To our knowledge, this is the lowest insertion loss demonstrated for an SPDT switch at 60 GHz in a CMOS process. With a control voltage of 1.2 V, the measured P1dB and IIP3 are 7.1 dBm and 18.2 dBm, respectively. The active chip area is 0.18×0.22 mm2.
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