45纳米CMOS技术在毫米波范围内的小信号和高频噪声性能

L. Poulain, N. Waldhoff, D. Gloria, F. Danneville, G. Dambrine
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引用次数: 21

摘要

在过去十年中,毫米波范围(mmW)应用的发展与硅技术的不断进步密切相关,硅技术通过积极的晶体管栅极长度缩小而不断发展。在此背景下,本文旨在介绍最近开发的45纳米体CMOS技术在毫米波范围内的直流、小信号和噪声性能。为此,在67 GHz范围内测量S参数,提取6-40 GHz频率范围内的高频(HF)噪声模型,并通过与晶体管处设置50 Ω阻抗的W波段噪声系数进行对比,验证其准确性。该技术提供的fT和fMAX分别为200 GHz和300 GHz,符合最新公布的45纳米CMOS技术的结果。同时,在94 GHz时的最小噪声值为4.5 dB(通过W波段噪声测量验证)。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Small signal and HF noise performance of 45 nm CMOS technology in mmW range
The development of applications in millimeter wave range (mmW) during the last decade is strongly related to continuous progress of Si Technology, which kept on evolving through aggressive transistor gate length down-scaling. In this context, this paper aims to present DC, small signal and noise performance up mmW range of recently developed 45-nm bulk CMOS Technology. For this purpose, S parameters were measured up to 67 GHz, a high frequency (HF) noise model was extracted in 6–40 GHz frequency range, and its accuracy verified through a comparison with the noise figure measured in W band with a 50 Ω impedance set at the transistor. The technology offers fT, fMAX respectively of 200 and 300 GHz in line with up-to-date published results for a 45 nm CMOS Technology. At the meantime, a minimum noise figure of 4.5 dB at 94 GHz is demonstrated (verified through W band noise measurements).
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