一种40nm低功耗高稳定SRAM单元,采用分离读端口和睡眠晶体管方法

J. Mishra, Harsh Srivastava, P. K. Misra, M. Goswami
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引用次数: 4

摘要

在较低的技术水平上,传统的六晶体管静态随机存取存储器(SRAM)单元的静态功耗和稳定性是一个主要问题。为了解决这个问题,本文提出了一种新的11晶体管(11T) SRAM单元,以提高读取稳定性并降低静态功耗。在提出的11T SRAM单元中,存储节点使用单独的读端口与读位线隔离,同时探索休眠晶体管方法以节省电力。与基本的6T SRAM单元、11T ST2 SRAM单元、11T ST1 SRAM单元、ST11T SRAM单元相比,该设计的读静态噪声裕度(RSNM)值分别提高了6倍、2.3倍、2.7倍和1.3倍。写入稳定性也比基本的6T SRAM单元提高了1.6倍,比11T SRAM单元提高了1.14倍,与其他11T SRAM单元相比降低了1.17倍。此外,使用睡眠晶体管方法,与基本的6T SRAM单元相比,所提出的设计的静态功耗降低了4.6倍。采用cadence virtuoso工具在40nm CMOS技术节点上对所提出的11T SRAM单元进行了验证。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 40nm Low Power High Stable SRAM Cell Using Separate Read Port and Sleep Transistor Methodology
At lower technology, the static power dissipation and stability of conventional six transistors static random access memory (SRAM) cell poses a major issue. To address this issue, a novel eleven transistor (11T) SRAM cell for improving read stability and reducing the static power dissipation is proposed in this work. In the proposed 11T SRAM cell, the storing node isolates from the read bit line using separate read port while sleep transistor methodology is explored for power saving. With this the read static noise margin (RSNM) value of proposed design is enhanced by 6x, 2.3x, 2.7x and 1.3x when compared with basic 6T SRAM cell, 11T ST2 SRAM cell, 11T ST1 SRAM cell, ST11T SRAM cell respectively. The write stability is also enhanced by 1.6x over basic 6T SRAM cell, 1.14x over 11T SRAM and penalty of 1.17x when compared with other 11T SRAM cell. Further, using the sleep transistor methodology the static power consumption of the proposed design has been reduced by 4.6x when compared with basic 6T SRAM cell. The proposed 11T SRAM cell has been verified in 40nm CMOS technology node using cadence virtuoso tool.
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