构建用于极化通用带隙的雕刻薄膜的柱状形态

Ricardo A. Fiallo, M. Horn, A. Lakhtakia
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引用次数: 0

摘要

柱状薄膜是通过物理气相沉积在适当的衬底上生长的具有纳米级横截面尺寸的平行直柱的集合。雕刻薄膜是类似的,但柱状的形状是为特定的目标而设计的。最大透过率在20%以下的偏振通用带隙被实现为两种不同类型的雕刻薄膜:(i)紧密交错匹配的双右手双层(TIMABs)来修饰圆形布拉格现象;(ii)显示布拉格现象的等手雕刻薄膜(ecstf)。柱的结构采用串联双沉积技术。样品的光学表征以及扫描电子显微镜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Architecting the columnar morphology of sculptured thin films for polarization-universal bandgaps
Columnar thin films are assemblies of parallel straight columns of nanoscale cross-sectional dimensions grown by physical vapor deposition on appropriate substrates. Sculptured thin films are similar, but the columnar shape is architected for specific objectives. Polarization-universal bandgaps with maximum transmittance under 20% were realized as sculptured thin films of two different types: (i) tightly interlaced matched ambidextrous bilayers (TIMABs) to modify the circular Bragg phenomenon and (ii) equichiral sculptured thin films (ECSTFs) that display the Bragg phenomenon. The serial bideposition technique was employed for architecting the columns. Samples characterized optically as well as with scanning electron microscopy.
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