基于p-GaN技术的电压基准和零电流检测器的工艺角补偿设计

Plinio Bau, Sebastian Gavira-Duque, F. Rothan, Cédric Reymond, D. Bergogne
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引用次数: 0

摘要

本文描述了两种设计和制造的功率器件集成电路,并给出了它们的主要测量特性。第一个电路是一个电压基准电路,用于补偿过程、电压和温度(PVT)。与最先进的电路相比,该电路的优势在于其调节性能,低电流消耗和表面要求(在第一个原型中仅为100 μ m x 60 μ m)。第二个电路是一个过零电流检测器,它也被设计成对工艺变化不敏感。它具有稳定的静态特性,在模拟中观察到的带宽大于10 MHz。这种电路的方便之处在于它的简单,因为不需要用差分放大器进行比较。这两种电路都被设计成与GaN技术中的功率晶体管集成,用于ACF或其他能够在650 V下切换的拓扑结构。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Voltage Reference and Zero Current Detector Monolithically Integrated on p-GaN Technology Designed for Process Corners Compensation
This work describes two designed and fabricated circuits for power device integration in 650 V e-mode GaN-on-Si technology and gives their main measured characteristics. The first circuit is a voltage reference designed to compensate process, voltage and temperature (PVT). The advantage of this circuit over state-of-the-art circuits is its performance of regulation, low current consumption and surface required (only 100 µm x 60 µm in the first prototype built). The second circuit is a zero-crossing current detector that is also designed to be insensitive to process variations. It exhibits stable static characteristics and bandwidth observed in simulation of more than 10 MHz. The convenience of this circuit is its simplicity because no differential amplifier is used to make a comparison. Both circuits are designed to be integrated with power transistors in GaN technology to be used in ACF or other topologies capable of switching at 650 V.
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