变角椭圆偏振光谱法研究GdF3薄膜的纳米结构

Jue Wang, R. Maier, P. Dewa, H. Schreiber, R. Bellman, David Dawson Elli
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引用次数: 0

摘要

随着准分子激光向193nm和157nm的深紫外和真空紫外波长扩展,光学涂层面临着消除可能的环境污染、减少散射损失和提高激光照射耐久性的挑战。宽禁带金属氟化物成为激光光学应用的首选材料。为了了解纳米氟化物薄膜的光学性质,采用变角椭圆偏振法对生长在CaF2(111)衬底上的GdF3薄膜进行了表征。采用一种有效的介质近似模型来确定膜孔隙率和表面粗糙度。利用改进的椭偏模型揭示了GdF3薄膜的结构演变,表明其存在3层结构,即底层致密,中间层多孔,顶表面粗糙。用原子力显微镜对膜的纳米结构和表面粗糙度进行了表征。实验证明了纳米结构对环境污染的吸引力。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Nanostructure of GdF3 thin film evaluated by variable angle spectroscopic ellipsometry
As excimer lasers extend to deep-ultraviolet and vacuum-ultraviolet wavelengths at 193nm and 157nm, optical coatings experience the challenge of eliminating possible environmental contamination, reducing scattering loss, and increasing laser irradiation durability. Wide band-gap metal fluorides become the materials of choice for the laser optics applications. In order to understand the optical properties of nanostructured fluoride films, thin GdF3 films grown on CaF2 (111) substrates were evaluated by variable angle spectroscopic ellipsometry. An effective medium approximation model was used to determine both the film porosity and the surface roughness. Structural evolution of the GdF3 film was revealed with improved ellipsometric modeling, suggesting the existence of 3-layer structure, a densified bottom layer, a porous middle layer and a rough top surface. The nanostructure of the film and the surface roughness were confirmed by atomic force microscopy. The attraction of the nano-structure to environmental contamination was experimentally demonstrated.
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