{"title":"利用MOS电容电流瞬态法测定载流子产生寿命","authors":"F. Kong, M. Lau, Y. Yeow","doi":"10.1109/COMMAD.1998.791683","DOIUrl":null,"url":null,"abstract":"A technique for the measurement of semiconductor minority carrier generation lifetime based on MOS capacitor current transients is presented. The lifetime is extracted by fitting a derived analytical model of the current transients to the experimental data. Values of lifetime obtained by this technique are shown to agree well with conventional capacitance transient methods. A 2D numerical simulation to verify the method is also presented.","PeriodicalId":300064,"journal":{"name":"1998 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings (Cat. No.98EX140)","volume":"06 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-12-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Determination of carrier generation lifetime via current transient in MOS capacitor\",\"authors\":\"F. Kong, M. Lau, Y. Yeow\",\"doi\":\"10.1109/COMMAD.1998.791683\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A technique for the measurement of semiconductor minority carrier generation lifetime based on MOS capacitor current transients is presented. The lifetime is extracted by fitting a derived analytical model of the current transients to the experimental data. Values of lifetime obtained by this technique are shown to agree well with conventional capacitance transient methods. A 2D numerical simulation to verify the method is also presented.\",\"PeriodicalId\":300064,\"journal\":{\"name\":\"1998 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings (Cat. No.98EX140)\",\"volume\":\"06 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-12-14\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"1998 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings (Cat. No.98EX140)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/COMMAD.1998.791683\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"1998 Conference on Optoelectronic and Microelectronic Materials and Devices. Proceedings (Cat. No.98EX140)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/COMMAD.1998.791683","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
Determination of carrier generation lifetime via current transient in MOS capacitor
A technique for the measurement of semiconductor minority carrier generation lifetime based on MOS capacitor current transients is presented. The lifetime is extracted by fitting a derived analytical model of the current transients to the experimental data. Values of lifetime obtained by this technique are shown to agree well with conventional capacitance transient methods. A 2D numerical simulation to verify the method is also presented.