双条带磁流变磁头的记录性能及过程容差

Yi‐min Guo, Y. Hsu, K. Ju
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引用次数: 12

摘要

在这项工作中,我们提出了屏蔽双条纹磁流变磁头的记录性能和工艺公差的分析。利用微磁模型,我们研究了孤立的回读脉冲,以及峰值不对称对两个磁条纹不匹配和偏离轨道不对准的依赖关系。结果表明,只要两个磁共振条纹远离其饱和区域,输出的差分模式就不会因两个磁共振条纹不匹配而产生严重的峰值不对称性。偏离轨道性能研究表明,峰值不对称也非常小,读写偏差高达0.5 /spl mu/m。发现线性分辨率与sal偏置的MR头相当,并且对两个MR条纹之间的间隔厚度不敏感。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Recording Performance & Process Tolerance Of Dual-stripe MR Heads
In this work, we present an analysis of the recording performance and process tolerance of shielded dual-stripe MR heads. Using a micromagnetic model, we study isolated read-back pulses and the dependence of the peak asymmetry on both mismatch of the two MR stripes and off-track misalignment. Results show as long as the two MR stripes are away from their saturation regions, the differential mode of the output does not have severe peak asymmetry caused by mismatch of the two MR stripes. The off-track performance study shows that peak asymmetry is also very small with up to 0.5 /spl mu/m read-to-write misalignment. The linear resolution is found to be comparable to that of SAL-biased MR heads and insensitive to the spacer thickness between the two MR stripes.
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