质子轰击砷化镓光导探测毫米波

C. S. Wong, G.M. Dai, H. Tsang
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引用次数: 0

摘要

我们证明离子损伤的砷化镓可以用于检测光导采样门中的毫米波。在200 keV的能量下注入10/sup / 14/ cm/sup -2/个质子剂量的半绝缘GaAs材料,与生长的半绝缘GaAs相比,信号噪声改善约11.4 dB。尽管离子注入材料中的载流子迁移率降低,但这种改进是由于载流子寿命缩短以及与离子破坏的半绝缘GaAs形成欧姆接触。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Photoconductive detection of millimetre waves using proton bombarded GaAs
We show that ion-damaged GaAs may be used to detect millimetre electromagnetic waves in photoconductive sampling gates. The semi-insulating GaAs material which was implanted with a dose of 10/sup 14/ cm/sup -2/ protons at an energy of 200 keV gave a signal to noise improvement of about 11.4 dB when compared with as-grown semi-insulating GaAs. The improvement is in spite of reduced carrier mobility in the ion-implanted material and is due to the shorter carrier lifetime and formation of Ohmic contacts with the ion-damaged semi-insulating GaAs.
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