基于仿真的n沟道ZnO薄膜晶体管性能估计

S. K. Dargar, J. K. Srivastava, Santosh Bharti, Abha Nyati
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引用次数: 2

摘要

高光透明度、低成本和优异的开关性能吸引了研究人员的注意,将ZnO作为TFT器件设计的潜在材料。在Sentaurus TCAD工具中对ZnO沟道薄膜晶体管的电学参数进行了仿真提取。研究的范围是基于从其传递特性中提取的参数来分析器件的性能。该器件具有1 × 10-4量级的高场效应迁移率,在电流-6.22 × 10-6 A、关断电流- 1.26 × 10-10 A时显著,通断比提高至105,可用于下一代柔性电子和显示器件。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Performance estimation of N-channel ZnO based thin film transistor using simulation
High optical transparency and low cost with excellent switching performance drew the attention of researchers in using ZnO as a potential material for TFT device design. The electrical parameter extraction of ZnO channel thin film transistor using simulation is carried out in Sentaurus TCAD tool. The scope of the research is to analyze the performance of the device on the basis of parameters extracted from its transfer characteristic. The device has shown high field effect mobility of order ~1 × 10-4, and significant on current -6.22 × 10-6 A, off current ~ 1.26 × 10-10 A with improved on-off ratio ~105, which makes the device reliable for the next generation of flexible electronics and display devices.
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