R. Völkel, H. P. Herzig, P. Nussbaum, W. Singer, R. Dändliker
{"title":"显微镜头光刻","authors":"R. Völkel, H. P. Herzig, P. Nussbaum, W. Singer, R. Dändliker","doi":"10.1364/domo.1996.dwb.4","DOIUrl":null,"url":null,"abstract":"The future demands for flat panel display (FPD) manufacturing is a resolution of 3-5 μm for large substrates of 550 × 650 mm2 size. Standard lithographic techniques, like wafer stepping or proximity printing can be used. Unfortunately, these methods have some severe drawbacks which significantly increase the fabrication costs. Using a wafer stepper, the small printing area will cause numerous exposure steps. The stepping has to be very accurate, because stitching errors can be easily seen in the display pattern. Using a proximity printer, the substrate is set some 20-50 μm behind the mask to achieve a resolution of 3-5 μm. This is not an easy task for large substrates. The costs for these highly planar substrates are immense. A direct contact may easily damage the expensive photomask.","PeriodicalId":301804,"journal":{"name":"Diffractive Optics and Micro-Optics","volume":"50 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Microlens Lithography\",\"authors\":\"R. Völkel, H. P. Herzig, P. Nussbaum, W. Singer, R. Dändliker\",\"doi\":\"10.1364/domo.1996.dwb.4\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The future demands for flat panel display (FPD) manufacturing is a resolution of 3-5 μm for large substrates of 550 × 650 mm2 size. Standard lithographic techniques, like wafer stepping or proximity printing can be used. Unfortunately, these methods have some severe drawbacks which significantly increase the fabrication costs. Using a wafer stepper, the small printing area will cause numerous exposure steps. The stepping has to be very accurate, because stitching errors can be easily seen in the display pattern. Using a proximity printer, the substrate is set some 20-50 μm behind the mask to achieve a resolution of 3-5 μm. This is not an easy task for large substrates. The costs for these highly planar substrates are immense. A direct contact may easily damage the expensive photomask.\",\"PeriodicalId\":301804,\"journal\":{\"name\":\"Diffractive Optics and Micro-Optics\",\"volume\":\"50 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Diffractive Optics and Micro-Optics\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1364/domo.1996.dwb.4\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Diffractive Optics and Micro-Optics","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1364/domo.1996.dwb.4","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The future demands for flat panel display (FPD) manufacturing is a resolution of 3-5 μm for large substrates of 550 × 650 mm2 size. Standard lithographic techniques, like wafer stepping or proximity printing can be used. Unfortunately, these methods have some severe drawbacks which significantly increase the fabrication costs. Using a wafer stepper, the small printing area will cause numerous exposure steps. The stepping has to be very accurate, because stitching errors can be easily seen in the display pattern. Using a proximity printer, the substrate is set some 20-50 μm behind the mask to achieve a resolution of 3-5 μm. This is not an easy task for large substrates. The costs for these highly planar substrates are immense. A direct contact may easily damage the expensive photomask.