显微镜头光刻

R. Völkel, H. P. Herzig, P. Nussbaum, W. Singer, R. Dändliker
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引用次数: 0

摘要

平板显示器(FPD)制造的未来需求是在550 × 650 mm2尺寸的大型基板上实现3-5 μm的分辨率。标准平版印刷技术,如晶圆步进或接近印刷可以使用。不幸的是,这些方法有一些严重的缺点,这大大增加了制造成本。使用晶圆步进器时,较小的印刷面积会引起许多曝光步进。步进必须非常精确,因为在显示图案中很容易看到拼接错误。使用近距离打印机,基板被设置在掩模后约20-50 μm,以实现3-5 μm的分辨率。对于大型衬底来说,这不是一件容易的事。这些高度平面的基板的成本是巨大的。直接接触很容易损坏昂贵的光掩膜。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Microlens Lithography
The future demands for flat panel display (FPD) manufacturing is a resolution of 3-5 μm for large substrates of 550 × 650 mm2 size. Standard lithographic techniques, like wafer stepping or proximity printing can be used. Unfortunately, these methods have some severe drawbacks which significantly increase the fabrication costs. Using a wafer stepper, the small printing area will cause numerous exposure steps. The stepping has to be very accurate, because stitching errors can be easily seen in the display pattern. Using a proximity printer, the substrate is set some 20-50 μm behind the mask to achieve a resolution of 3-5 μm. This is not an easy task for large substrates. The costs for these highly planar substrates are immense. A direct contact may easily damage the expensive photomask.
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