以氧化石墨烯为氧交换层的金属氧化物RRAM

Pratheek Gopalakrishnan, Nacer Ibaroudene, S. Ganguli, Anisha Roy, Ethan C. Ahn
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摘要

在这项工作中,提出了一种新的界面工程方法来解决新兴金属氧化物电阻随机存取存储器(RRAM)器件技术相对较大的周期变异性。这是通过合成具有可控缺陷的溶液可加工石墨纳米片(还原氧化石墨烯,rGO)并将其作为氧交换层(OEL)集成到RRAM中来实现的。结果表明,与具有传统过渡金属薄膜作为OEL的RRAM相比,插入rgo的RRAM在SET开关中表现出更低的周期间可变性。这最好归因于我们的还原氧化石墨烯薄膜为每个编程周期提供了几乎相同数量的易氧化原子位。该研究有望通过为提高深度学习模型的准确性铺平一条切实可行的途径,极大地推进基于rram的神经形态计算。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Metal-oxide RRAM with rGO as oxygen exchange layer
In this work, a novel interface engineering method is proposed to address the relatively large cycle-to-cycle variability of the emerging metal-oxide resistive random access memory (RRAM) device technology. This is achieved by synthesizing the solution-processable graphitic nanosheet (reduced graphene oxide, rGO) with defects of a controllable amount and further integrating it into RRAM as an oxygen exchange layer (OEL). It is demonstrated that rGO-inserted RRAM exhibits reduced cycle-to-cycle variability in the SET switching as compared with one that has a conventional transition metal thin film as OEL. This is best attributed to the fact that our rGO thin film provides nearly the same amount of oxidation-prone atomic sites for each programming cycle. This study is expected to greatly advance the RRAM-based neuromorphic computing by paving a practically viable route to enhance the accuracy of the deep learning model.
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