高性能纳米技术的设计挑战

Goutam Debnath, P. J. Thadikaran
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引用次数: 1

摘要

仅供教程使用的摘要表单。本教程介绍了纳米技术时代VLSI设计中遇到的设计挑战及其解决方案的关键方面。重点是在微处理器设计中遇到的设计挑战。它捕获了高级体系结构建模、可制造性设计(DFM)、布局综合、标准单元设计和性能验证等领域的设计问题。它描述了用纳米技术满足功率、时序、物理尺寸和过程可移植性目标的要求。它还解决了对产品推向市场有直接影响的前期和后期硅验证困难。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Design Challenges for High Performance Nano-Technology
Summary form only for tutorial. This tutorial present the key aspects of design challenges and its solutions that are being experienced in VLSI design in the era of nanotechnology. The focus is on design challenges that are experienced in microprocessor designs. It captures the design issues in the areas of high level architectural modeling, design for manufacturability (DFM), layout synthesis, standard cell design, and performance verification. It describes the requirements to meet power, timing, physical dimension and process portability goals with nanotechnology. It also addresses the pre and post silicon verification difficulties that have a direct impact on taking the product to market.
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