等离子体成像光刻的操作能量分析

Proceedings of the 2007 IEEE International Symposium on Electronics and the Environment Pub Date : 2007-05-07 DOI:10.1109/ISEE.2007.369374

T. Zhang, S. W. Bates, D. Dornfeld

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引用次数: 1

摘要

等离子体成像光刻(PIL)是一种基于磁盘驱动技术的新型直写光刻工艺。利用类似规模的掩模和无掩模光刻工艺的基准，本文评估了PIL的操作能源使用，作为制造和环境影响分析的一个组成部分。这项研究有两个目的:为这种新兴技术的可持续发展提供信息，并确定PIL最适合于每次设计变更11片或更少晶圆的原型或高度敏捷制造。

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Operational Energy Analysis of Plasmonic Imaging Lithography

Plasmonic imaging lithography (PIL) is a new direct-write lithograghy process based on disk drive technology. Using the benchmark of similarly scaled masked and maskless lithography processes, this paper evaluates the operational energy use of PIL, as a component of manufacturing and environmental impact analysis. This study serves two purposes: to inform the sustainable development of this emerging technology, and to identify PIL as most appropriate for prototyping or highly agile manufacturing of 11 or fewer wafers per design change.

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Proceedings of the 2007 IEEE International Symposium on Electronics and the Environment

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