实现PZT厚膜微驱动器的沉积和图像化技术

R. Maeda, J. Chu, A. Schroth, J. Akedo, M. Ichiki, Z. Wang, S. Yonekubo
{"title":"实现PZT厚膜微驱动器的沉积和图像化技术","authors":"R. Maeda, J. Chu, A. Schroth, J. Akedo, M. Ichiki, Z. Wang, S. Yonekubo","doi":"10.1109/IMNC.1998.730068","DOIUrl":null,"url":null,"abstract":"Introduction: Deposition technology of thin PZT layer has reached an advanced state in the application area of memory fabrication. On the other hand, the application of PZT layer for actuation of micro electromechanical system (MEMS) is not well established. Relatively thicker film is necessary in this application. Conventional preparation techniques provide poor deposition rates and the accumulated residual stress during deposition results in peal off of the deposited layered structure. Another difficulty lies in the low etching rate of the multilayered structure of Si02/Ti/Pt/PZT/Ti/Pt.","PeriodicalId":356908,"journal":{"name":"Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1998-07-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Deposition And Patterning Technique For Realization Of PZT Thick Film Micro Actuator\",\"authors\":\"R. Maeda, J. Chu, A. Schroth, J. Akedo, M. Ichiki, Z. Wang, S. Yonekubo\",\"doi\":\"10.1109/IMNC.1998.730068\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"Introduction: Deposition technology of thin PZT layer has reached an advanced state in the application area of memory fabrication. On the other hand, the application of PZT layer for actuation of micro electromechanical system (MEMS) is not well established. Relatively thicker film is necessary in this application. Conventional preparation techniques provide poor deposition rates and the accumulated residual stress during deposition results in peal off of the deposited layered structure. Another difficulty lies in the low etching rate of the multilayered structure of Si02/Ti/Pt/PZT/Ti/Pt.\",\"PeriodicalId\":356908,\"journal\":{\"name\":\"Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)\",\"volume\":\"9 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1998-07-13\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IMNC.1998.730068\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IMNC.1998.730068","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0

摘要

简介:PZT薄层沉积技术在存储器制造应用领域已达到先进水平。另一方面,PZT层在微机电系统(MEMS)驱动中的应用还不是很成熟。在这种应用中需要较厚的薄膜。传统的制备技术提供了较差的沉积速率,并且沉积过程中积累的残余应力导致沉积层状结构的剥落。另一个难点在于Si02/Ti/Pt/PZT/Ti/Pt多层结构的蚀刻速率低。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Deposition And Patterning Technique For Realization Of PZT Thick Film Micro Actuator
Introduction: Deposition technology of thin PZT layer has reached an advanced state in the application area of memory fabrication. On the other hand, the application of PZT layer for actuation of micro electromechanical system (MEMS) is not well established. Relatively thicker film is necessary in this application. Conventional preparation techniques provide poor deposition rates and the accumulated residual stress during deposition results in peal off of the deposited layered structure. Another difficulty lies in the low etching rate of the multilayered structure of Si02/Ti/Pt/PZT/Ti/Pt.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信