基于180nm CMOS技术的6.5 mw 5 gbps片上差分传输线互连及低延迟非对称传输

T. Ishii, H. Ito, M. Kimura, K. Okada, K. Masu
{"title":"基于180nm CMOS技术的6.5 mw 5 gbps片上差分传输线互连及低延迟非对称传输","authors":"T. Ishii, H. Ito, M. Kimura, K. Okada, K. Masu","doi":"10.1109/ASSCC.2006.357869","DOIUrl":null,"url":null,"abstract":"This paper proposes an on-chip differential- transmission-line (DTL) interconnect to reduce delay and power consumption in long global interconnects. The DTL interconnect can transmit signals at near light-of-speed with small power dissipation of Tx. The proposed DTL interconnect consists of Tx, DTL and Rx, and an asymmetric Tx is employed to reduce offset delay in Tx. In the measurement result, 5 Gbps signal transmission can be achieved through 3 mm-length interconnect, and delay and total power consumption are 140 ps and 6.5 mW, respectively. A 180 nm standard CMOS process was utilized. Figure of merit (FoM) for on-chip interconnects is proposed to evaluate delay and power consumption. The proposed DTL interconnect is compared with the conventional RC, DTL and optical interconnects, and it achieves the highest FoM at more than 5 mm length.","PeriodicalId":142478,"journal":{"name":"2006 IEEE Asian Solid-State Circuits Conference","volume":"29 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2006-11-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"15","resultStr":"{\"title\":\"A 6.5-mW 5-Gbps On-Chip Differential Transmission Line Interconnect with a Low-Latency Asymmetric Tx in a 180nm CMOS Technology\",\"authors\":\"T. Ishii, H. Ito, M. Kimura, K. Okada, K. Masu\",\"doi\":\"10.1109/ASSCC.2006.357869\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"This paper proposes an on-chip differential- transmission-line (DTL) interconnect to reduce delay and power consumption in long global interconnects. The DTL interconnect can transmit signals at near light-of-speed with small power dissipation of Tx. The proposed DTL interconnect consists of Tx, DTL and Rx, and an asymmetric Tx is employed to reduce offset delay in Tx. In the measurement result, 5 Gbps signal transmission can be achieved through 3 mm-length interconnect, and delay and total power consumption are 140 ps and 6.5 mW, respectively. A 180 nm standard CMOS process was utilized. Figure of merit (FoM) for on-chip interconnects is proposed to evaluate delay and power consumption. The proposed DTL interconnect is compared with the conventional RC, DTL and optical interconnects, and it achieves the highest FoM at more than 5 mm length.\",\"PeriodicalId\":142478,\"journal\":{\"name\":\"2006 IEEE Asian Solid-State Circuits Conference\",\"volume\":\"29 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2006-11-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"15\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2006 IEEE Asian Solid-State Circuits Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/ASSCC.2006.357869\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2006 IEEE Asian Solid-State Circuits Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/ASSCC.2006.357869","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 15

摘要

本文提出了一种片上差分在线传输(DTL)互连,以降低长全局互连中的延迟和功耗。DTL互连可以以接近光速的速度传输信号,且传输信号的功耗很小。本文提出的DTL互连由Tx、DTL和Rx组成,并采用非对称的Tx来减少Tx的偏移延迟。在测量结果中,通过3mm长度的互连可以实现5 Gbps的信号传输,延迟和总功耗分别为140 ps和6.5 mW。采用180 nm标准CMOS工艺。提出了片上互连的性能图(FoM)来评估延迟和功耗。将所提出的DTL互连与传统的RC互连、DTL互连和光互连进行了比较,结果表明该互连在长度大于5 mm时达到了最高的FoM。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
A 6.5-mW 5-Gbps On-Chip Differential Transmission Line Interconnect with a Low-Latency Asymmetric Tx in a 180nm CMOS Technology
This paper proposes an on-chip differential- transmission-line (DTL) interconnect to reduce delay and power consumption in long global interconnects. The DTL interconnect can transmit signals at near light-of-speed with small power dissipation of Tx. The proposed DTL interconnect consists of Tx, DTL and Rx, and an asymmetric Tx is employed to reduce offset delay in Tx. In the measurement result, 5 Gbps signal transmission can be achieved through 3 mm-length interconnect, and delay and total power consumption are 140 ps and 6.5 mW, respectively. A 180 nm standard CMOS process was utilized. Figure of merit (FoM) for on-chip interconnects is proposed to evaluate delay and power consumption. The proposed DTL interconnect is compared with the conventional RC, DTL and optical interconnects, and it achieves the highest FoM at more than 5 mm length.
求助全文
通过发布文献求助,成功后即可免费获取论文全文。 去求助
来源期刊
自引率
0.00%
发文量
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
copy
已复制链接
快去分享给好友吧!
我知道了
右上角分享
点击右上角分享
0
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信