F. Ahlers, J. Kučera, W. Poirier, B. Jeanneret, A. Satrapinski, A. Tzalenchuk, P. Vrabcek, T. Bergsten, C. Hwang, R. Yakimova, S. Kubatkin
{"title":"EMRP项目GraphOhm -迈向基于石墨烯的量子电阻计量","authors":"F. Ahlers, J. Kučera, W. Poirier, B. Jeanneret, A. Satrapinski, A. Tzalenchuk, P. Vrabcek, T. Bergsten, C. Hwang, R. Yakimova, S. Kubatkin","doi":"10.1109/CPEM.2014.6898502","DOIUrl":null,"url":null,"abstract":"A new joint research project (JRP) integrating metrology institutes and universities from nine countries is aimed at realization of a new generation of standards for quantum resistance metrology. The project exploits graphene's properties to simplify operation of standards without compromising the unprecedented precision delivered by semiconductor quantum Hall devices. Higher operating temperatures (above 4.2 K, and up to 8 K) and together with lower magnetic fields (below 5 T, and potentially down to 2 T) will lead to a significantly improved and cost-saving dissemination of intrinsically referenced resistance standards to all end-users relying on electrical measurements.","PeriodicalId":256575,"journal":{"name":"29th Conference on Precision Electromagnetic Measurements (CPEM 2014)","volume":"86 2 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2014-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"The EMRP project GraphOhm - Towards quantum resistance metrology based on graphene\",\"authors\":\"F. Ahlers, J. Kučera, W. Poirier, B. Jeanneret, A. Satrapinski, A. Tzalenchuk, P. Vrabcek, T. Bergsten, C. Hwang, R. Yakimova, S. Kubatkin\",\"doi\":\"10.1109/CPEM.2014.6898502\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"A new joint research project (JRP) integrating metrology institutes and universities from nine countries is aimed at realization of a new generation of standards for quantum resistance metrology. The project exploits graphene's properties to simplify operation of standards without compromising the unprecedented precision delivered by semiconductor quantum Hall devices. Higher operating temperatures (above 4.2 K, and up to 8 K) and together with lower magnetic fields (below 5 T, and potentially down to 2 T) will lead to a significantly improved and cost-saving dissemination of intrinsically referenced resistance standards to all end-users relying on electrical measurements.\",\"PeriodicalId\":256575,\"journal\":{\"name\":\"29th Conference on Precision Electromagnetic Measurements (CPEM 2014)\",\"volume\":\"86 2 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2014-10-02\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"29th Conference on Precision Electromagnetic Measurements (CPEM 2014)\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/CPEM.2014.6898502\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"29th Conference on Precision Electromagnetic Measurements (CPEM 2014)","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/CPEM.2014.6898502","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
The EMRP project GraphOhm - Towards quantum resistance metrology based on graphene
A new joint research project (JRP) integrating metrology institutes and universities from nine countries is aimed at realization of a new generation of standards for quantum resistance metrology. The project exploits graphene's properties to simplify operation of standards without compromising the unprecedented precision delivered by semiconductor quantum Hall devices. Higher operating temperatures (above 4.2 K, and up to 8 K) and together with lower magnetic fields (below 5 T, and potentially down to 2 T) will lead to a significantly improved and cost-saving dissemination of intrinsically referenced resistance standards to all end-users relying on electrical measurements.