厚度对射频溅射制备Ni/NiO多层结构迟滞周期的影响

A. Bendjerad, A. Benhaya, F. Smaili, F. Djeffal, A. Lahmar, H. Ferhati
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引用次数: 0

摘要

本文通过实验研究了厚度参数对薄镍基(Ni/NiO)多层膜的磁性、结构和磁滞循环特性的影响。采用射频溅射技术在室温下沉积了多层结构。利用x射线衍射仪(XRD)和磁强计(VSM)等合适的实验设备,分析了沉积结构的结构和滞后周期特征,对沉积结构进行了全面研究,绘制了滞后特性的实验周期随温度和多层结构厚度的变化曲线。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Effect of Thickness on the Hysteresis Cycles of Ni/NiO Multilayer Structure Prepared Using RF Sputtering Technique
In this work, an experimental investigation of the impact of the thickness parameter on the magnetic, structural and hysteresis cycle characteristics of thin Ni-based (Ni/NiO) multi-layers was carried out. The multilayer structure has been deposited using RF sputtering technique at room temperature. A comprehensive study of the deposited structure was performed by analyzing the structural and hysteresis cycle characteristics via appropriate experimental facilities such as X-Ray Diffraction (XRD) and magnetometer (VSM) platform, in order to plot the experimental cycles of hysteresis properties as a function of temperature and the thickness of the multilayer structure.
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