芯片设计过程的建模与仿真:RS模型

A. Hassine, E. Barke
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引用次数: 5

摘要

国际半导体技术路线图(ITRS)报告了技术进步所能提供的(就单个芯片上的晶体管数量而言)与设计这些复杂芯片的能力之间的分歧越来越大:ldquo设计差距。芯片设计行业发展到非常复杂的过程,需要管理方法来掌握它们。缺少以模拟方式评估项目过程和结果的可能性会导致损失飙升。在本文中,我们提出了一种允许以正式方式对设计过程建模的先锋方法。基于该模型的模拟器原型实现验证了该模型的正确性。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
On modeling and simulating chip design processes: The RS model
The International Technology Roadmap for Semiconductors (ITRS) reports about the increasing divergence between what technological advances afford (in terms of the number of transistors on a single chip) and the capability to design these complex chips: the ldquoDesign Gaprdquo. The chip design industry evolved into very sophisticated and complex processes needing managerial approaches to master them. Missing possibilities to evaluate course and outcome of projects in a simulative way entail soaring losses. In this paper, we present a pioneer approach that allows for modeling design processes in a formal manner. A prototype implementation of a simulator based on our model attests the appropriateness of the model.
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