{"title":"芯片设计过程的建模与仿真:RS模型","authors":"A. Hassine, E. Barke","doi":"10.1109/IEMCE.2008.4617958","DOIUrl":null,"url":null,"abstract":"The International Technology Roadmap for Semiconductors (ITRS) reports about the increasing divergence between what technological advances afford (in terms of the number of transistors on a single chip) and the capability to design these complex chips: the ldquoDesign Gaprdquo. The chip design industry evolved into very sophisticated and complex processes needing managerial approaches to master them. Missing possibilities to evaluate course and outcome of projects in a simulative way entail soaring losses. In this paper, we present a pioneer approach that allows for modeling design processes in a formal manner. A prototype implementation of a simulator based on our model attests the appropriateness of the model.","PeriodicalId":408691,"journal":{"name":"2008 IEEE International Engineering Management Conference","volume":"49 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2008-06-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"5","resultStr":"{\"title\":\"On modeling and simulating chip design processes: The RS model\",\"authors\":\"A. Hassine, E. Barke\",\"doi\":\"10.1109/IEMCE.2008.4617958\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"The International Technology Roadmap for Semiconductors (ITRS) reports about the increasing divergence between what technological advances afford (in terms of the number of transistors on a single chip) and the capability to design these complex chips: the ldquoDesign Gaprdquo. The chip design industry evolved into very sophisticated and complex processes needing managerial approaches to master them. Missing possibilities to evaluate course and outcome of projects in a simulative way entail soaring losses. In this paper, we present a pioneer approach that allows for modeling design processes in a formal manner. A prototype implementation of a simulator based on our model attests the appropriateness of the model.\",\"PeriodicalId\":408691,\"journal\":{\"name\":\"2008 IEEE International Engineering Management Conference\",\"volume\":\"49 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2008-06-28\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"5\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"2008 IEEE International Engineering Management Conference\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1109/IEMCE.2008.4617958\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"2008 IEEE International Engineering Management Conference","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEMCE.2008.4617958","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
On modeling and simulating chip design processes: The RS model
The International Technology Roadmap for Semiconductors (ITRS) reports about the increasing divergence between what technological advances afford (in terms of the number of transistors on a single chip) and the capability to design these complex chips: the ldquoDesign Gaprdquo. The chip design industry evolved into very sophisticated and complex processes needing managerial approaches to master them. Missing possibilities to evaluate course and outcome of projects in a simulative way entail soaring losses. In this paper, we present a pioneer approach that allows for modeling design processes in a formal manner. A prototype implementation of a simulator based on our model attests the appropriateness of the model.